Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Manfred Maul"'
Autor:
Christoph Hennerkes, Manfred Maul, Jens Timo Neumann, Jörg Zimmermann, Sean Park, Joep de Vocht, Paul Gräupner, Michael Patra, Melchior Mulder, Oscar Noordman, Bernd Geh, Dirk Jürgens, Andre Engelen, Dirk Hellweg
Publikováno v:
SPIE Proceedings.
The application of customized and freeform illumination source shapes is a key enabler for continued shrink using 193 nm water based immersion lithography at the maximum possible NA of 1.35. In this paper we present the capabilities of the DOE based
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f4932bc74e55b1768c513cf20e0a5be
https://doi.org/10.1117/12.847282
https://doi.org/10.1117/12.847282
Autor:
Frank Hartung, Robert Kazinczi, Scott Halle, Young O. Kim, Frank Rohmund, Jaione Tirapu-Azpiroz, Joerg Zimmermann, Geoffrey W. Burr, John A. Hoffnagle, Rene Carpaij, Joost Hageman, Daniel Corliss, Bernhard Kneer, Saeed Bagheri, Christoph Hennerkes, Carsten Russ, Michael S. Hibbs, Manfred Maul, Alfred Wagner, Donis G. Flagello, Greg McIntyre, Moutaz Fakhry, Tom Faure, Martin Burkhardt, Alan E. Rosenbluth, Kafai Lai, Andre Engelen, Kehan Tian, Remco Jochem Sebastiaan Groenendijk, Emily Gallagher, David O. S. Melville
Publikováno v:
SPIE Proceedings.
We demonstrate experimentally for the first time the feasibility of applying SMO technology using pixelated illumination. Wafer images of SRAM contact holes were obtained to confirm the feasibility of using SMO for 22nm node lithography. There are st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8fce3aad081efaf57fa2ff563aa36102
https://doi.org/10.1117/12.814680
https://doi.org/10.1117/12.814680
Autor:
James G. Tsacoyeanes, Gary Politi, Manfred Maul, Vladan Blahnik, Jan Baselmans, Michael Patra, A. S. Tychkov, Oscar Noordman
Publikováno v:
SPIE Proceedings.
In recent years the topic of speckle in optical projection microlithography received increasing interest because of its potential contribution to line width roughness (LWR). Speckle is a light interference effect that causes the dose delivered to the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2544b1d51068b9e28034d982eb95f91c
https://doi.org/10.1117/12.814169
https://doi.org/10.1117/12.814169
Autor:
Helmut Haidner, Oscar Noordman, Melchior Mulder, Manfred Maul, Marco Hugo Petrus Moers, Jan van Schoot, Robert John Socha, Jan Baselmans, Donis G. Flagello, Xuelong Shi, Jo Finders, Andre Engelen, Wim de Boeij, Martin Schriever, Rene Carpaij, Ulrich Wegmann, Markus Goeppert, Mark van de Kerkhof, Paul Graeupner, Henk van Greevenbroek
Publikováno v:
SPIE Proceedings.
Current roadmaps show that the semiconductor industry continues to drive the usable Rayleigh resolution towards thefundamental limit (for 50% duty cycle lines) at k 1 =0.25. This is being accomplished through use of various resolutionenhancement tech
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07698b9bd527cac614680a8761581b9b
https://doi.org/10.1117/12.485340
https://doi.org/10.1117/12.485340
Autor:
Gary Politi, Vladan Blahnik, Michael Patra, Jan Baselmans, Oscar Noordman, Manfred Maul, James G. Tsacoyeanes, A. S. Tychkov
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:043002
In recent years speckle in optical projection microlithography received increasing interest because of its potential contribution to linewidth roughness (LWR). Speckle is a light interference effect that causes the dose delivered to the reticle to be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7128f779af79e23a5605e857d13b637
https://doi.org/10.1117/1.3256131
https://doi.org/10.1117/1.3256131
Publikováno v:
Applied Optics. 27:4638
We report an optical range sensor that combines the advantages of focus sensing and interferometry. It works for specularly reflecting objects and for diffusely reflecting objects. The sensor is simple, robust against vibrations, and has high depth r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::72ffea770f15778931fdd3c73d1291c8
https://doi.org/10.1364/ao.27.004638
https://doi.org/10.1364/ao.27.004638
Autor:
Oscar Noordman, Andrey Tychkov, Jan Baselmans, James Tsacoyeanes, Gary Politi, Michael Patra, Vladan Blahnik, Manfred Maul
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Oct2009, Vol. 8 Issue 4, p043002-043002-10, 1p