Výsledky vyhledávání - "Manae Sonoda"

Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

Autor: Manae Sonoda, Tomohiro Takayama, Ryoichi Hoshino, Hironori Asada, Minako Iwakuma, Yukiko Kishimura, Shunsuke Ochiai

Publikováno v: SPIE Proceedings.

The positive tone resist consisted of methyl-α-chloroacrylate (ACM) and α-methylstyrene (MS) has higher sensitivity and higher dry etching resistance than poly (methylmethacrylate) (PMMA) due to the presence of a chlorine atom and a phenyl group. C

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2ead852ce4cc2c7244c9368c4b259cef
https://doi.org/10.1117/12.2279079

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Investigation of fabrication process for sub 20-nm dense pattern of non-chemically amplified electron beam resist based on acrylic polymers

Autor: Minako Iwakuma, Yukiko Kishimura, Ryoichi Hoshino, Shunsuke Ochiai, Manae Sonoda, Tomohiro Takayama, Hironori Asada

Publikováno v: SPIE Proceedings.

In this study, we examine exposure characteristics of a positive tone electron beam resist consisting of methyl α- chloroacrylate and α-methylstyrene by changing the development process conditions. 25/25 nm and 30/30 nm line-andspace (L/S) patterns

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c6df3e92ac33f9db47f00306d2e31cf3
https://doi.org/10.1117/12.2242986

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