Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Manabu Tomisaka"'
Autor:
Seung Jin Oh, Takuji Okamura, Masataka Hoshino, Kazuo Kondo, Manabu Tomisaka, Kenji Takahashi, Hitoshi Yonemura, Jian-Jun Sun
Publikováno v:
Journal of the Electrochemical Society. 152(11):173-177
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced signal delay. Formation of suitable vias by electrodeposition into cavities presents a filling problem similar to that encountered in the damascene pr
Autor:
Takuji Okamura, Yuichi Taguchi, Kenji Takahashi, Hitoshi Yonemura, Toshihiro Yonezawa, Masataka Hoshino, Kazuo Kondo, Seung Jin Oh, Manabu Tomisaka
Publikováno v:
Journal of Japan Institute of Electronics Packaging. 6:596-601
Through chip electrodes with high aspect ratios used for three dimensional packaging can offer the shortest interconnection and reduce signal delay. Copper has good compatibility to conventional multi layer interconnection in LSI and BEOL (back end o
Autor:
Manabu Bonkohara, Yoshihiko Nemoto, Kenji Takahashi, Tadahiro Morifuji, Tomotoshi Sato, Manabu Tomisaka, Masahiro Sunohara, Yoshihiro Tomita
Publikováno v:
JOURNAL OF CHEMICAL ENGINEERING OF JAPAN. 36:119-125
The electroless tin-plating on copper has the preferable characteristics for the thermal compression bonding, although it is easy to decrease in thickness by heating at the bonding because of the diffusion with copper. Therefore, the bonding profile
Autor:
Kazuo Kondo, Kenji Takahashi, Masataka Hoshino, Toshihiro Yonezawa, Manabu Tomisaka, Yuichi Taguchi, Hitoshi Yonemura
Publikováno v:
Extended Abstracts of the 2003 International Conference on Solid State Devices and Materials.
Through chip electrodes with high aspect ratios offer the shortest interconnection and reduce signal delay. In this work, filling vias with higher aspect ratio copper, 10 μm in square and 70 μm in depth, used for through chip electrodes was investi
Publikováno v:
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials.
Publikováno v:
Japanese Journal of Applied Physics. 36:2822
An in situ optical observation method for investigations of fluoride surface modification induced by electron irradiation was developed for the purpose of improving the heteroepitaxy of semiconductors on fluorides. Spectra of reflected light after th
Publikováno v:
Japanese Journal of Applied Physics; May 1997, Vol. 36 Issue: 5 p2822-2822, 1p