Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Manabu Ishibashi"'
Autor:
Manabu Ishibashi, Yasuhiro Tanabe, Masao Utsunomiya, Yutaka Kaburagi, Takashi Kyotani, Eiichi Yasuda
Publikováno v:
Carbon. 40:1949-1955
The effect of Ti, Nb and Ta on the anti-oxidation of furan-resin-derived carbons was investigated by thermogravimetric analysis combined with gas/mass spectroscopy, Hall coefficient and magnetoresistance measurements, transmission electron microscopy
Publikováno v:
Carbon. 39:294-297
Publikováno v:
SPIE Proceedings.
Novel Optical Proximity Correction (OPC) flow using the new compact lithography model which predicts wafer patterns formed by the trim-mask lithography has been developed. The trim-mask lithography has been indispensable to manufacture the random-log
Autor:
Akio Kotani, Kazuo Yamada, Kenichi Kobori, Kenneth M. Jones, Manabu Ishibashi, Yuichi Shibui, Motokuni Yano, Kiyoshi Sakashita, Yutaka Kugai, Kenji Hatakenaka
Publikováno v:
Frontiers in Computer Graphics ISBN: 9784431680277
Computer graphics has found many applications in various fields in recent years. Industrial Design is an important task in the development process of many manufactured products. However, in the opinion of the authors many CAD/CAM systems have ignored
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5c1b22eaf52e9fc3c0646f1fb70f902
https://doi.org/10.1007/978-4-431-68025-3_18
https://doi.org/10.1007/978-4-431-68025-3_18
Akademický článek
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