Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Man-Hyoung Ryoo"'
Publikováno v:
Journal of Photopolymer Science and Technology. 19:579-583
Novel alkaline developable top-coat materials containing a bulky silicon group are presented. This bulky silicon group endows transparency at 193nm wavelength and hydrophobicity to the top-coat. Good pattern profiles and negligible changes of lithogr
Autor:
Man-Hyoung Ryoo, Jin-Young Yoon, Hyun-Woo Kim, Sang-Gyun Woo, Jung-Hwan Ha, Mitsuhiro Hata, Han-Ku Cho
Publikováno v:
Journal of Photopolymer Science and Technology. 18:621-625
Immersion barrier coat was formulated and evaluated on ArF photoresists from view points of profiles and lithographic performances with both dry and wet conditions. Hydrophobic group, acid group, and polar group were introduced into base polymer to r
Publikováno v:
Microelectronic Engineering. :723-728
The lithographic performance of DUV-based TSI, bi-layer and single-layer CA resists imaged at the EUV wavelength is reported and compared. The images exhibit a very high aspect ratio and good profiles. This means that a DUV-based CA resist process ca
Autor:
Man-Hyoung Ryoo, Shigeru Shirayone, Hiroaki Oizumi, Shigeo Irie, Shinji Okazaki, Iwao Nishiyama, Ei Yano, Hiromasa Yamanashi
Publikováno v:
Journal of Photopolymer Science and Technology. 14:561-565
One of the important issues in EUVL is the outgassing problem because the contamination caused by the resist outgassing decreases the reflectivity of the reflective mask and the imaging optics. In this report, we evaluated the resist and resin ougass
Autor:
Man-Hyoung Ryoo, Hakze Chon
Publikováno v:
Microporous Materials. 10:35-40
Co(II)saloph (N, N-bis(salicylidene)-1,2-phenylenediamino-cobalt (II)) was encapsulated into VPI-5 and AlPO4-8. Aluminophosphate-hosted cobalt complexes were obtained by impregnating VPI-5 with Co(saloph). Co(saloph) encapsulated into AlPO4-8 was obt
Publikováno v:
SPIE Proceedings.
Immersion barrier coats were formulated and evaluated on ArF photoresist in view of interaction between photoresist and top coats. Acrylate polymers having an acid-labile protecting group, an acid group, and a polar group were synthesized to realize
Autor:
Man-Hyoung Ryoo, Yun Sook Chae, Sang-Jun Choi, Jung Hwan Hah, Yun-Kyeong Jang, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Publikováno v:
SPIE Proceedings.
ArF lithography is in the early stage of mass production and also is going to be further extended to 40nm generation with the aid of immersion lithography. Therefore, it is important to make ArF process production-friendly and extendible for the cont
Autor:
Man-Hyoung Ryoo, Hakze Chon
Publikováno v:
Journal of the Chemical Society, Faraday Transactions. 93:3259-3261
A temperature-dependent photoacoustic technique was used to elucidate the structural transformation of aluminophosphate molecular sieves, AlPO 4 -21/AlPO 4 -25 and AlPO 4 –H 3 /AlPO 4 –C/AlPO 5 –D. The definite transformation temperature of AlP
Autor:
Jung Hwan Hah, Joo-Tae Moon, Man-Hyoung Ryoo, Sang-Gyun Woo, Subramanya Mayya, Han-Ku Cho, Byung-Il Ryu, Mitsuhiro Hata, Hyun-Woo Kim
Publikováno v:
SPIE Proceedings.
Electrostatic self-assembly (ESA) is combined with optical lithography to develop a novel process to form 70 nm space patterns to overcome the resolution limit of ArF lithography with numerical aperture (NA) of 0.75. It is proven that patterned photo
Publikováno v:
SPIE Proceedings.
It is becoming difficult for the lithography progress to keep pace with the acceleration of design rule shrinkage and high integration of memory devices. In order to retain the acceleration, low k1 processes beyond the limitation of wavelength are re