Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Mamoru Okabe"'
Autor:
Mamoru Okabe, Yukio Taguchi
Publikováno v:
JOURNAL OF RURAL PLANNING ASSOCIATION. 24:187-193
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27e7bb20dfdc74692ace7ad5db1b4996
https://doi.org/10.2750/arp.24.187
https://doi.org/10.2750/arp.24.187
Autor:
Mamoru Okabe, Yukio Taguchi
Publikováno v:
JOURNAL OF RURAL PLANNING ASSOCIATION. 20:229-234
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e51979fe3283762ddbd4f14249e3aa07
https://doi.org/10.2750/arp.20.20-suppl_229
https://doi.org/10.2750/arp.20.20-suppl_229
Autor:
Kyosuke Kobayashi, Mamoru Okabe
Publikováno v:
JOURNAL OF RURAL PLANNING ASSOCIATION. 19:253-258
This study analyzes the change of the structure and the occurrence of the surplus labor force at the agricultural village through the break of latifundio at the cantral Andes highland region in Ecuador. The data from the field survey by the reporter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6083055fcfc3b4dd3ba50934bc2cc7fa
https://doi.org/10.2750/arp.19.19-suppl_253
https://doi.org/10.2750/arp.19.19-suppl_253
Autor:
Yukio Taguchi, Mamoru Okabe
Publikováno v:
JOURNAL OF RURAL PLANNING ASSOCIATION. 19:199-204
The perpose of this study is to review the procedures and progress of rural agricultural promotion based on Tozo Suzuki's throries during modern Japanese capitalism. His throries were implemented in Nagasaki village, Iwate prefecture, in northern Hon
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34c3f03fcf17927593f9db6104b5f95a
https://doi.org/10.2750/arp.19.19-suppl_199
https://doi.org/10.2750/arp.19.19-suppl_199
Autor:
Katsumi Suzuki, Youichi Usui, Mamoru Okabe, Yoshihiro Koyama, Yasuhiko Sugiyama, Osamu Suga, Ryoji Hagiwara, Tomokazu Kozakai, Masashi Muramatsu, Tatsuya Adachi, Naoki Nishida, Fumio Aramaki, Osamu Matsuda, Toshio Doi, Yoshiyuki Tanaka, Anto Yasaka
Publikováno v:
SPIE Proceedings.
Repair technology for 65nm generation photomasks requires more accurate shape and transmittance. The objective of this study is to evaluate FIB repair process with low acceleration voltage. The evaluation items were imaging impact, defect visibility,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6e4f5626b2284c16c99c1e353aa8134
https://doi.org/10.1117/12.691195
https://doi.org/10.1117/12.691195
Autor:
Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7762506dbb59af2dc57aa703066d5486
https://doi.org/10.1117/12.632756
https://doi.org/10.1117/12.632756
Autor:
Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b41098a2f66ac75dfe7a30b74006cb6f
https://doi.org/10.1117/12.557789
https://doi.org/10.1117/12.557789
Autor:
Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5131cb9b89ed07e2752cabc17e8521c
https://doi.org/10.1117/12.518026
https://doi.org/10.1117/12.518026
Autor:
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8e8ef68f93754cffc35734e6b06f63d
https://doi.org/10.1117/12.504212
https://doi.org/10.1117/12.504212
Autor:
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Hiroshi Sawaragi, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
The design rule of the semiconductor devices is getting dramatically tighter as the progress of lithography technology. Photomask is a key factor to support the lithography technology. Defect repairing technology becomes more important than ever for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c68388164d1372cf2f0dd4efe9ea2e4d
https://doi.org/10.1117/12.467357
https://doi.org/10.1117/12.467357