Zobrazeno 1 - 10
of 48
pro vyhledávání: '"Malcolm C. Gower"'
Publikováno v:
Sensors and Actuators A: Physical. 215:22-29
We report a silicon MEMS optical accelerometer based on the Fabry–Perot interferometer (FPI) principle in which the displacement of the proof mass is mechanically amplified by a V-beam structure prior to transduction. Mechanical amplification allow
Publikováno v:
2016 6th Electronic System-Integration Technology Conference (ESTC).
We demonstrate a novel micro-welding process in which laser-generated stress waves produced close to the bonding site assist in the formation of direct metal-metal bonds. The process has been used to attach copper-bumped silicon flip-chips to silver-
Publikováno v:
2013 IEEE 26th International Conference on Micro Electro Mechanical Systems (MEMS).
A method is reported for improving the performance of a Fabry-Perot optical accelerometer, based on the use of a V-beam mechanism to amplify the proof mass displacement. Amplification allows the sensitivity to be increased without compromising bandwi
Autor:
Malcolm C. Gower
Publikováno v:
Optics letters. 11(7)
Photoinduced open-circuit pyroelectric and saturated photovoltaic fields of ~200 and ~10 V/cm, respectively, have been measured in a self-pumped phase-conjugating (PC) BaTiO(3) crystal. Saturated photovoltaic field, photoresistivity, and grating eras
Autor:
Malcolm C. Gower
Publikováno v:
SPIE Proceedings.
Reports in 1982 of polymers ablated and etched by excimer laser radiation mark the founding of laser microfabrication as a technology that in the intervening period has matured into a manufacturing process used by a diverse range of industries. This
Autor:
Kunio Watanabe, Julian S. Cashmore, Jae-Hwan Kim, Malcolm C. Gower, Toshifumi Suganaga, Toshiro Itani, Noriyoshi Kanda
Publikováno v:
SPIE Proceedings.
157-nm lithography is being investigated for the sub-65nm technology node of semiconductor devices. Many efforts have been reported on the exposure tool, the F2 laser, the resist materials, the resist processing and the mask materials. A critical com
Autor:
Kunio Watanabe, Seiro Miyoshi, Osamu Yamabe, Toshifumi Suganaga, Takamitsu Furukawa, Jae-Hwan Kim, Malcolm C. Gower, Julian S. Cashmore, Noriyoshi Kanda, Toshiro Itani
Publikováno v:
SPIE Proceedings.
l57nm lithography is being investigated for the sub-7Onm technology node of semiconductor devices. Many efforts have been reported on the exposure tool, the F2 laser, the resist materials, the resist processing and the mask materials1. A critical com
Publikováno v:
SPIE Proceedings.
A Microstepper exposure tool for high-resolution imaging applications incorporating the F 2 157nm laser is described. Details are presented of the optical architecture including beams shaping, homogenization and imaging objectives. Results from the h
Autor:
Karl L. Boehlen, Ric Allott, Bob Bann, Malcolm C. Gower, Charles E. Abbott, Ines Stassen Boehlen, Neil Sykes, Phil T. Rumsby
Two new laser mask projection techniques Synchronized Image Scanning (SIS) and Bow Tie Scanning (BTS) have been developed for the efficient fabrication of dense arrays of repeating 3D microstructures on large area substrates. Details of these techniq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc4efa0fd3f7ffcd8e0cfdd8abad5d8d
https://hdl.handle.net/11475/16448
https://hdl.handle.net/11475/16448
Publikováno v:
SPIE Proceedings.
With the aim of reducing the heat-affected zone to improve edge quality, we present results of drilling microholes using reshaped pulsed Gaussian laser beams. A diode-pumped, high repetition rate, nanosecond pulse duration 3rd harmonic Nd:YAG laser w