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Scopus-Elsevier
This paper reports the experimental results of examining the residual stress and stress gradient of LPCVD multilayered polysilicon film according to various rapid thermal annealing (RTA) in a nitrogen atmosphere. In particular the stress gradient of
Autor:
Hiroshi Otani, Makio Horikawa, Shuichi Tani, Masahiro Tsugai, Shigeru Hamada, Daisuke Katagiri
Publikováno v:
Scopus-Elsevier
In order to clarify the stress concentration and surface roughness effect on strength of the polycrystalline silicon (poly-Si) structure, bending tests of poly-Si microcantilever beam specimen and surface roughness measurement is performed. The bendi
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