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pro vyhledávání: '"Maik Schönfeld"'
Autor:
Hella-Christin Scheer, Si Wang, Christian Steinberg, Maik Schönfeld, Jens Saupe, Jürgen Grimm, Khalid Dhima, Marc Papenheim
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 32:06FG01
Relief of residual stress in an imprinted polymer may affect the replication fidelity by leading to recovery. The level of stress induced in the polymer depends on the method of imprint. For example, a “soft” imprint with an elastomeric stamp use
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1f259b71cdf3e045380186cb2d84f13
https://doi.org/10.1116/1.4895794
https://doi.org/10.1116/1.4895794
