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pro vyhledávání: '"Mahmoud M. Khojastech"'
Autor:
Hoa D. Truong, Wu-Song Huang, Mahmoud M. Khojastech, Hiroshi Ito, P. Rao Varanasi, Sean D. Burns, Mike Lercel, Dirk Pfeiffer
Publikováno v:
Journal of Photopolymer Science and Technology. 18:355-364
Positive 193 nm bilayer resists based on polysilsesquioxane are described. Fluoroalcohol is employed as an acid group instead of carboxylic acid because of its more attractive dissolution properties. Polymers were carefully analyzed by 19F, 13C, and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b86ad827c55f736f6ddde9ecc76367fe
https://doi.org/10.2494/photopolymer.18.355
https://doi.org/10.2494/photopolymer.18.355
