Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Mahesh Pitchumani"'
Publikováno v:
IEEE Photonics Technology Letters. 17:1441-1443
In this work we demonstrate, for the first time to our knowledge, a novel subwavelength optical element for the selective excitation of the TE/sub 01/ mode inside a 300-/spl mu/m bore diameter hollow-glass waveguide (HGW) in order to reduce the trans
Publikováno v:
SPIE Proceedings.
Bending loss is the biggest drawback to hollow waveguides used for light delivery applications such as laser ablation. One way to overcome this limitation without changing the fiber design or fabrication is to engineer the input light to excite speci
Publikováno v:
SPIE Proceedings.
In this paper we present the fabrication of refractive micro optical elements by additive sculpting of the photoresist using binary amplitude masking techniques. We also present the fabrication of micro optical elements by pre sculpting the photoresi
Publikováno v:
SPIE Proceedings.
In this paper, we present a new photo-mask technology capable of forming a continuous relief micro-optic profile on thick photo-resist. This technique eliminates many of the drawbacks of gray-scale and half-tone masking technology. An optical stepper
Publikováno v:
Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing.
The use of a vortex phase optic as a coupling element for a dual mode step index fiber system is presented. We introduce a novel but rather simple coupling scheme for selectively exciting the LP11 mode in a step index fiber that is a single mode at a
Publikováno v:
Applied optics. 42(11)
In optical lithography the degradation of image quality due to aberrations present in the exposure tool is a serious problem. Therefore it is desirable to establish a reliable aberration measurement procedure based on the analysis of printed images i
Publikováno v:
Micromachining Technology for Micro-Optics and Nano-Optics.
An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applie
Autor:
Waleed S. Mohammed, Laurent Vaissie, Jinwon Sung, Heidi Hockel, Eric G. Johnson, Mahesh Pitchumani
Publikováno v:
Diffractive Optics and Micro-Optics.
An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This method utilizes varying exposure times and masks to combine binary and analog photo-masks to sculpt complex photoresist
Publikováno v:
Diffractive Optics and Micro-Optics.
In this paper, we present a method for incorporating diffractive optics on a photomask for aberration characterization. This allows for a manipulation of the incident illumination to the amplitude mask for estimating the aberration coefficients.
Publikováno v:
SPIE Proceedings.
Micro-Optics have begun to play a key role in micro-photonic systems and devices. This is largely due to the fact that semiconductor processing has enabled one to incorporate complex optical functions and integration features into the actual optical