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pro vyhledávání: '"Magda Petryniak"'
Autor:
Steven J. Holmes, Paul A. Rabidoux, Magda Petryniak, Ratnam Sooriyakumaran, John L. Sturtevant, Richard A. Ferguson, Ronald M. Martino, William R. Brunsvold, Jeffrey D. Gelorme, Will Conley
Publikováno v:
Advances in Resist Technology and Processing X.
This paper discusses a new negative tone aqueous base developable photoresist that has demonstrated excellent sub-half micron resolution with commercially available DUV (deep ultraviolet) exposure systems. This system which consists of a phenolic res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d23d9a79e1feb85867fb8af3d502cc8
https://doi.org/10.1117/12.154744
https://doi.org/10.1117/12.154744
