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From the Proceedings of the 1988 Meetings of the Arizona Section - American Water Resources Association and the Hydrology Section - Arizona-Nevada Academy of Science - April 16, 1988, University of Arizona, Tucson, Arizona
Externí odkaz:
http://hdl.handle.net/10150/296419
Autor:
Mack, Chris Alan
Publikováno v:
Digital version accessible at.
Thesis (Ph. D.)--University of Texas at Austin, 1998.
Vita. Includes bibliographical references (leaves 122-130). Available also in a digital version from Dissertation Abstracts.
Vita. Includes bibliographical references (leaves 122-130). Available also in a digital version from Dissertation Abstracts.
Externí odkaz:
http://wwwlib.umi.com/cr/utexas/main
Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we describe how
Externí odkaz:
http://arxiv.org/abs/1206.4148
Publikováno v:
In Microelectronic Engineering 15 April 2018 190:33-37
Akademický článek
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Publikováno v:
Proceedings of SPIE; April 2024, Vol. 12953 Issue: 1 p129530B-129530B-8, 1165779p
Autor:
Sendelbach, Matthew J., Schuch, Nivea G., Bunday, Benjamin D., Mack, Chris, Klotzkin, Shari, Patriarche, Douglas, Ball, Yvette
Publikováno v:
Proceedings of SPIE; April 2024, Vol. 12955 Issue: 1 p129551T-129551T-13, 12825563p
Autor:
Sendelbach, Matthew J., Schuch, Nivea G., Huang, Tsu-Wen, Ho, Ken-Huan, Yang, Cheng-Wei, Kung, Yao-Hsiung, Su, Lin-Chin, Mack, Chris A.
Publikováno v:
Proceedings of SPIE; April 2024, Vol. 12955 Issue: 1 p129551A-129551A-9, 1165969p