Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Maciej Murakowski"'
Autor:
Hongtao Lin, J. David Musgraves, Sylvain Danto, Stephen Kozacik, Dennis W. Prather, Kathleen Richardson, Yi Zou, Lan Li, Juejun Hu, Fei Deng, Maciej Murakowski, Chaoying Ni
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII.
Chalcogenide glasses, namely the amorphous compounds containing sulfur, selenium, and/or tellurium, have emerged as a promising material candidate for mid-infrared integrated photonics given their wide optical transparency window, high linear and non
Publikováno v:
SPIE Proceedings.
Passive millimeter-wave (mmW) sensors are especially suited to persistent surveillance applications due to their ability to operate during day/night conditions and through transient atmospheric obscurants such as clouds, rain and fog. The contrast of
Autor:
Lionel C. Kimerling, Yi Zou, Stephen Kozacik, Hongtao Lin, Sylvain Danto, Juejun Hu, Vivek Singh, Dennis W. Prather, J. David Musgraves, Anu Agarwal, Lan Li, Kathleen Richardson, Maciej Murakowski, Pao T. Lin
Publikováno v:
Optics letters. 38(9)
We demonstrated high-index-contrast, waveguide-coupled As2Se3 chalcogenide glass resonators monolithically integrated on silicon fabricated using optical lithography and a lift-off process. The resonators exhibited a high intrinsic quality factor of
Autor:
David L. K. Eng, Suman Addya, Dennis W. Prather, Ahmed Sharkawy, Stephen Kozacik, Maciej Murakowski, Matthew R. Konkol, Mathew J. Zablocki, Janusz Murakowski, Benjamin C. Olbricht, Shouyuan Shi
Publikováno v:
SPIE Proceedings.
Dual vertical slot modulators leverage the field enhancement provided by the continuity of the normal electric flux density across a boundary between two dielectrics to increase modal confinement and overlap for the propagating optical and RF waves.
Autor:
David L. K. Eng, Stephen Kozacik, Mathew J. Zablocki, Benjamin C. Olbricht, Maciej Murakowski, Dennis W. Prather, Shouyuan Shi
Publikováno v:
8th IEEE International Conference on Group IV Photonics.
Our recently-proposed optical-RF dual slot modulator achieves nanoscale confinement and can afford extremely low V π modulators. These devices require the convergence of novel materials and processing techniques to integrate organic materials and si
Autor:
Maciej Murakowski, Dennis W. Prather, Christopher A. Schuetz, Richard D. Martin, John P. Wilson, Thomas E. Dillon
Publikováno v:
SPIE Proceedings.
A new technique for improvised explosive device (IED) creation uses an explosive device buried in foam and covered in a layer of dirt. These devices are difficult to detect visually, however, their material characteristics make them detectable by pas
Autor:
Maciej Murakowski, Garrett J. Schneider, Christopher A. Schuetz, Janusz Murakowski, John P. Wilson, Dennis W. Prather
Publikováno v:
SPIE Proceedings.
As millimeter-wave imaging technology becomes more mature, several applications are emerging for which this technology may be useful. However, effectively predicting the nuances of millimeter-wave phenomenology on the usefulness for a given applicati
Autor:
Christopher A. Schuetz, Maciej Murakowski, E. Lee Stein, John P. Wilson, Janusz Murakowski, Dennis W. Prather, Richard D. Martin, Jesse P. Samluk, Daniel G. Mackrides
Publikováno v:
SPIE Proceedings.
Passive millimeter-wave (mmW) imaging has many specific defense, security and safety applications, due to the fact that all terrestrial bodies above absolute zero are emissive, and these wavelengths are not scattered by normal obscurants such as haze
Autor:
Dennis W. Prather, Garrett J. Schneider, Lindsay Prather, Maciej Murakowski, Janusz Murakowski, Peng Yao
Publikováno v:
SPIE Proceedings.
In the past two decades, photonic crystals (PhCs) have received rapidly increasing attentions for their unique properties of confining, directing and manipulating the propagation of electromagnetic waves. Since the lattice constant is usually compara
Publikováno v:
SPIE Proceedings.
In this paper, we present and demonstrate a novel, versatile lithography method with high resolution that we call Chemical Lithography (ChemLith). The concept is based on the fact that most of the commonly used photoresists change their solubility up