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pro vyhledávání: '"Mac Mellish"'
Autor:
Warren Montgomery, Yu-Jen Fan, Jun Sung Chun, Cecilia A Montgomery, Scott McWilliams, Mac Mellish
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
EUV lithographers have continued to reduce the barriers to high Volume Manufacturing (HVM) introduction. Tool, mask and photoresist manufacturers have made excellent progress on several fronts, including resolution of many EUV source related issues,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::067f3cbdb76daece8a9e7bd34180f01f
https://doi.org/10.1117/12.2222065
https://doi.org/10.1117/12.2222065
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:021603
The semiconductor industry is transitioning toward the use of extreme ultraviolet (EUV) lithography as a next generation patterning technology. There are currently only a limited number of high resolution EUV photoresists reported with EUV patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b3720eccdefc243cbe790c975b38620
https://doi.org/10.1116/1.4975797
https://doi.org/10.1116/1.4975797
Publikováno v:
SPIE Proceedings.
With each new generation of e-beam mask writers comes the ability to write leading edge photomasks with improved patterning performance and increased throughput. However, these cutting-edge e-beam tools are often used with older generation resists, p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dda7a522e5edc1bcadebebbaf61b15a
https://doi.org/10.1117/12.978665
https://doi.org/10.1117/12.978665