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pro vyhledávání: '"Maarten Mathijs Marinus Jansen"'
Autor:
Silvester Houweling, John Zimmerman, Laurens de Winters, Brian Blum, Juan Diego Arias Espinoza, Kamali Mohammad Reza, Yang Liu, Hans Meiling, Marco Reijnen, Joost de Hoogh, Nina Vladimirovna Dziomkina, Kursat Bal, Luigi Scaccabarozzi, Ijen van Mil, Carmen Zoldesi, Ronald Frank Kox, Henk Meijer, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Azeredo Lima Jorge Manuel, Derk Brouns, Robert de Kruif, Alain Kempa, Xiong Xugang, Guus Bock, Daniel Smith, Florian Didier Albin Dhalluin, Maarten Mathijs Marinus Jansen
Publikováno v:
Wood, O.R.Panning, E.M., Extreme Ultraviolet (EUV) Lithography V, 90481N-1-90481N-10
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::834bd6f420e0f7cc25eefca0c14b11bb
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
