Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ma, Shixu"'
Publikováno v:
In Colloids and Surfaces A: Physicochemical and Engineering Aspects 20 November 2024 701
Autor:
Ma Shixu, Wang Juan, Yuan-yi Li, Jing Liu, Bo Wang, Bin Xu, Jiang Xia, Xing Haibo, Fu-Xiang Tian, Hu Xiaojun
Publikováno v:
Chemosphere. 221:292-300
In this paper, it was demonstrated that UV/H2O2 process can not only obviously promote the degradation rate of IO3−, but also greatly enhance iodo-trihalomethanes (I-THMs) formation in sequential chloramination. UV/H2O2 exhibited much faster IO3−
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28fbf0af8ecc799ffb9ab557c4be4891
https://doi.org/10.1016/j.chemosphere.2019.01.014
https://doi.org/10.1016/j.chemosphere.2019.01.014
Autor:
Bo Wang, Ye Wenkai, Xing Haibo, Fu-Xiang Tian, Hu Xiaojun, Wei-Hong Xia, Fan Lai, Yu-qiong Gao, Bin Xu, Ma Shixu
Publikováno v:
Chemical Engineering Journal. 398:125570
The UV-induced advanced oxidation processes (AOPs, including UV/Cl2, UV/NH2Cl, UV/ClO2 and UV/H2O2) degradation kinetics and energy requirements of iopamidol as well as DBPs-related toxicity in sequential disinfection were compared in this study. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9de18b7e7069111baef48585d31e2130
https://doi.org/10.1016/j.cej.2020.125570
https://doi.org/10.1016/j.cej.2020.125570