Experimental StudyonEffects of Film Thickness on Structural Characteristics of ITO Thin Film Prepared by RF Sputtering

Autor: SULU H.T, MOREH A.U, Iliyasu M.I, Abubakar M.B, Aina A.O, MUSTAPHA K. A, Sulyman. A

Publikováno v: International Journal of Advances in Scientific Research and Engineering (IJASRE), ISSN:2454-8006, DOI: 10.31695/IJASRE; Vol. 7 No. 12: IJASRE Dec-2021; 1-8

This paper presents the effects of low-temperature annealing and film thickness on the structural characteristics of ITO thin film for photovoltaic applications. The thin film of thickness 40nm, 60nm, and 85nm were grown on glass substrate using radi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5ee4ca95ff67cb93e50d3e1150afdfa6
https://doi.org/10.31695/ijasre.2021.34107