COMPUTER SIMULATION OF GAS-PHASE PLASMA CHEMISTRY AND SILICON ION CLUSTER FORMATION DURING PECVD.

Autor: STEKOLNIKOV, A. F., FESHCHENKO, D. V., METELSKIY, T. A., BELICH, R. F.

Publikováno v: Physics, Chemistry & Application of Nanostructures - Reviews & Short Notes To Nanomeeting-2001; 2001, p424-427, 4p