Zobrazeno 1 - 10
of 14
pro vyhledávání: '"M.H. Dicks"'
Autor:
Anthony J. Walton, Stewart Smith, M.H. Dicks, J.T.M. Stevenson, C.L. Brown, Michael N. Kozicki, S. Enderling, Maria Mitkova
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 19:2-9
This paper presents work on the development, fabrication and characterization of a suspended Greek cross measurement platform that can be used to determine the sheet resistance of materials that would contaminate Complementary Metal Oxide Semiconduct
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35c309d5ed1e54e3e87d58fb44e7e8e4
https://doi.org/10.1109/tsm.2005.863248
https://doi.org/10.1109/tsm.2005.863248
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 17:84-90
This paper presents work on the analysis of the effect of Joule heating on sheet resistivity measurements using Greek cross test structures. As part of this work, design rules have been derived to minimize the heating effect associated with currents
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df51c3485a8fe0a9b95581510688f197
https://doi.org/10.1109/tsm.2004.826961
https://doi.org/10.1109/tsm.2004.826961
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 17:91-97
A novel process is presented which produces platinum features using direct UV exposure of the photosensitive organometallic material. The technique reduces the number of process steps involved when creating a metal pattern on a substrate by not requi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07cd7d34b4b5f1c5269e56159644ba16
https://doi.org/10.1109/tsm.2004.826965
https://doi.org/10.1109/tsm.2004.826965
Autor:
G.M. Broxton, M.H. Dicks, J. Lobban, Anthony J. Walton, Alan M. Gundlach, J.T.M. Stevenson, J. Thomson
Publikováno v:
Proceedings of the 2004 International Conference on Microelectronic Test Structures (IEEE Cat. No.04CH37516).
A test chip is reported to characterise MOS transistors with a platinum gate fabricated using a solid organometallic material. Threshold and source-drain characteristics are presented along with oxide leakage measurements. These results are compared
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21df611a4fbc4025615322b2d0419739
https://doi.org/10.1109/icmts.2004.1309476
https://doi.org/10.1109/icmts.2004.1309476
Publikováno v:
International Conference on Microelectronic Test Structures, 2003..
This paper analyses the temperature rises associated with the currents forced during the measurement of Greek cross test structures. Simulations were performed using Finite Element (FE) analysis software which indicated that the temperature can be dr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::806fec9ff096fed852ba7a0c52422aed
https://doi.org/10.1109/icmts.2003.1197361
https://doi.org/10.1109/icmts.2003.1197361
Publikováno v:
International Conference on Microelectronic Test Structures, 2003..
A novel process is presented which produces platinum features using direct UV exposure of a photosensitive organometallic material. The deposited films are metallic and have a good adhesion to silicon dioxide. A test chip with MOS capacitors and shee
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9131f90168a81824f9bdfa732b846d7
https://doi.org/10.1109/icmts.2003.1197362
https://doi.org/10.1109/icmts.2003.1197362
Autor:
J.T.M. Stevenson, S. Enderling, C.L. Brown, A.W.S. Ross, Michael N. Kozicki, M.H. Dicks, Maria Mitkova, Stewart Smith, Anthony J. Walton
Publikováno v:
Scopus-Elsevier
A novel method is reported to measure the sheet resistance of materials that are incompatible with a CMOS process, using suspended polysilicon Greek cross test structures. To demonstrate the technique, gold (Au) was blanket evaporated in various thic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4daae1a189a2f2407187ebd5bea16a21
http://www.scopus.com/inward/record.url?eid=2-s2.0-27644595555&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-27644595555&partnerID=MN8TOARS
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