Zobrazeno 1 - 10
of 89
pro vyhledávání: '"M.C. Vella"'
Autor:
M.C. Vella, Antonio Cascio, Mario Giuffrè, Luigi Campa, Claudia Colomba, Giovanni Corsello, Salvatore Giordano, Lucia Siracusa
Publikováno v:
Italian Journal of Pediatrics, Vol 46, Iss 1, Pp 1-8 (2020)
Italian Journal of Pediatrics
Italian Journal of Pediatrics
Objective To describe a case of thrombophlebitis associated with Candida infection and to analyze other published reports to define clinical characteristics, prognostic data, diagnostic and therapeutic strategies. Study design A computerized search w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6a567b3f4037964c0f06b623e35c4a1f
https://doi.org/10.1186/s13052-020-00913-5
https://doi.org/10.1186/s13052-020-00913-5
Autor:
F. Amato, A.L. Neri, Anna Vadalà, M.C. Vella, Santina Cottone, R. Riccobene, C. Zagarrigo, Mangano Mt, Giuseppe Mulè, Giovanni Cerasola, G. Piazza
Publikováno v:
American Journal of Hypertension. 13:172-176
Previous evidence has demonstrated a relationship between growth factors and cardiovascular diseases. This study was aimed at evaluating levels of some endothelium-derived growth factors, and their relationship with microalbuminuria (MAU), in essenti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5048b0702a0a3035fe03a3c7d014bfdf
https://doi.org/10.1016/s0895-7061(99)00169-7
https://doi.org/10.1016/s0895-7061(99)00169-7
Publikováno v:
Scopus-Elsevier
The present study was performed to compare circulating levels of tumour necrosis factor-alpha (TNFalpha) and plasma endothelin 1 (ET-1), of hypertensive patients with or without renal failure and with those of normotensive healthy subjects. The study
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::51c47177a784fae4a12ac738a4683d40
https://doi.org/10.1038/sj.jhh.1000596
https://doi.org/10.1038/sj.jhh.1000596
Publikováno v:
Blood Pressure. 7:144-148
In vitro studies demonstrated a relationship between ET-1 and basic Fibroblast Growth Factor (bFGF), and of bFGF with Platelet Derived Growth Factor (PDGF). The present study was carried out to investigate in vivo the behaviour after vascular stress
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7d9aeeb56faea44f28e4c8f8d2ce242e
https://doi.org/10.1080/080370598437349
https://doi.org/10.1080/080370598437349
Publikováno v:
Fusion Engineering and Design. :395-400
We are currently constructing a prototype quadrupole electromagnet for the proposed Induction Linac Systems Experiments (ILSE) at LBNL. ILSE (PUB-5219, 1989 (Lawrence Berkeley Laboratory)) will address many physics and engineering issues relevant to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2782735c2c0075427f11bcb952385cfb
https://doi.org/10.1016/s0920-3796(96)00495-4
https://doi.org/10.1016/s0920-3796(96)00495-4
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 96:48-51
The mechanism responsible for charging damage to integrated circuit device insulators is treated as a plasma phenomenon, in which the beam/plasma drives potential differences on the process surface. J−V data obtained with the CHARM2 diagnostic in a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::819abd78b0d41ecc7e764d9d27143cd3
https://doi.org/10.1016/0168-583x(94)00452-8
https://doi.org/10.1016/0168-583x(94)00452-8
Akademický článek
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Publikováno v:
Proceedings of 1st International Symposium on Plasma Process-Induced Damage.
A unified view of wafer charging effects during ion implantation has been developed based on (1) measurements of plasma current-voltage (J-V) characteristics with wafer-based, EEPROM sensors and (2) a viable model which describes the main features of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30eea7cebade56e2ad664c212edb7a0a
https://doi.org/10.1109/ppid.1996.715238
https://doi.org/10.1109/ppid.1996.715238
Autor:
W. Lukaszek, M.I. Current, J. Shields, M.C. Vella, S. Daryanani, D. Wagner, L. Larson, T. Rhoad
Publikováno v:
2003 8th International Symposium Plasma- and Process-Induced Damage..
Charging characteristics of As/sup +/, BF/sub 2//sup +/, and B/sup +/ high-current ion implants, performed at different energies and different plasma flood system settings, were measured using bare and resist-covered CHARM/spl reg/-2 wafers patterned
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::795282022d289b1e8db2b5bb469681c1
https://doi.org/10.1109/ppid.2003.1200952
https://doi.org/10.1109/ppid.2003.1200952
Autor:
M. Reilly, Hiroyuki Ito, Y. Matsunaga, M.C. Vella, K. Yoneda, H. Asechi, M. Niwayama, W. Hacker
Publikováno v:
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).
The Plasma Flood System, a low energy electron generator, has been widely used as an effective tool to neutralise wafer charging induced by ion implantation. Although it has been successful in achieving the full device yield under high current ion im
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f76ef9b99542bdf0f0c72fd6e96cd65
https://doi.org/10.1109/iit.1999.812156
https://doi.org/10.1109/iit.1999.812156