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of 74
pro vyhledávání: '"M.C. Acero"'
Autor:
Francesca Campabadal, Rosana Rodriguez, M.C. Acero, Javier Martin-Martinez, Montserrat Nafria, Xavier Aymerich, Mireia Bargallo Gonzalez
Publikováno v:
Recercat. Dipósit de la Recerca de Catalunya
instname
Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Digital.CSIC. Repositorio Institucional del CSIC
instname
Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Digital.CSIC. Repositorio Institucional del CSIC
Trabajo presentado en la 19th Conference on Insulating Films on Semiconductors 2015, celebrado en Udine (Italia), del 29 de junio al 2 de julio de 2015
In this work, random telegraph noise (RTN) associated to discrete current fluctuations in the
In this work, random telegraph noise (RTN) associated to discrete current fluctuations in the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6e29d0fd4ca6d639a86bbffe2026811f
http://hdl.handle.net/2072/407352
http://hdl.handle.net/2072/407352
Autor:
Adrian Faigon, L. Sambuco Salomone, Salvador Dueñas, M.C. Acero, Héctor García, Helena Castán, Francesca Campabadal, M. M. Mallol, Mireia Bargallo Gonzalez
Publikováno v:
UVaDOC: Repositorio Documental de la Universidad de Valladolid
Universidad de Valladolid
UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname
Digital.CSIC. Repositorio Institucional del CSIC
Universidad de Valladolid
UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname
Digital.CSIC. Repositorio Institucional del CSIC
Producción Científica
The γ-radiation effects on the electrical characteristics of metal–insulator-semiconductor capacitors based on HfO2, and on the resistive switching characteristics of the structures have been studied. The HfO2 was grow
The γ-radiation effects on the electrical characteristics of metal–insulator-semiconductor capacitors based on HfO2, and on the resistive switching characteristics of the structures have been studied. The HfO2 was grow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4372b4ac58dc5d594c74bf346d352d1d
https://doi.org/10.1007/s11664-018-6257-y
https://doi.org/10.1007/s11664-018-6257-y
Autor:
Helena Castán, Salvador Dueñas, Mireia Bargallo Gonzalez, Héctor García, M.C. Acero, Francesca Campabadal
Publikováno v:
2017 Spanish Conference on Electron Devices (CDE).
The electrical properties of Al 2 O 3 -based metal-insulator-semiconductor capacitors have been investigated. Three different metal gate electrodes were used: two mid-gap metals (TiN and tungsten) and aluminum, a metal with a work function close to t
Publikováno v:
2017 Spanish Conference on Electron Devices (CDE).
In this work, an in-depth electrical characterization of the resistive switching phenomena in HfO 2 /n+Si-based RRAM devices with two different top electrode (TE) materials, Ni and Cu, is performed. The results show that when Ni is employed a signifi
Publikováno v:
2017 Spanish Conference on Electron Devices (CDE).
In this work, TiN/Ti/HfO 2 /W devices have been fabricated and their resistive switching (RS) characteristics have been assessed. The analysis of the obtained results indicates an asymmetric bipolar RS behavior with two very well defined resistance s
Akademický článek
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Autor:
Javier Martin-Martinez, Mireia Bargallo Gonzalez, Francesca Campabadal, Montserrat Nafria, M. Maestro, M.C. Acero
Publikováno v:
Digital.CSIC. Repositorio Institucional del CSIC
instname
instname
In this paper, the presence of filamentary current instabilities in the high resistance state of Ni/HfO2-based RRAM devices and their associated current fluctuations mechanisms are explored. After systematic measurements, the advanced weighted time-l
Autor:
Javier Sánchez, Ana Sánchez, Joan Marc Rafi, Robert Andreu, Francesca Campabadal, M.C. Acero, M. Zabala
Publikováno v:
Scopus-Elsevier
Digital.CSIC. Repositorio Institucional del CSIC
instname
Digital.CSIC. Repositorio Institucional del CSIC
instname
Trabajo presentado en 5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society, celebrado del 5 al 7 de octubre de 2009
A patterning technology for very thin layers of HfO2 layers grown by atomic layer deposition i
A patterning technology for very thin layers of HfO2 layers grown by atomic layer deposition i
Publikováno v:
2015 10th Spanish Conference on Electron Devices (CDE).
In this work, a systematic study of the electrical properties and the cycle-to-cycle variability in Ni/HfO 2 -based RRAM devices is presented. Besides the resistive switching behavior, attention is also given to the impact of temperature on device st
Autor:
Francesca Campabadal, O. Beldarrain, M. Zabala, Marta Duch, Mireia Bargallo Gonzalez, M.C. Acero
Publikováno v:
2015 10th Spanish Conference on Electron Devices (CDE).
Blistering of 11 nm and 45 nm-thick Al 2 O 3 layers deposited by ALD on silicon substrates is studied in Al-Al 2 O 3 -Si structures fabricated using a field isolated process. Blisters are shown to be unevenly distributed and with different dimensions