Výsledky vyhledávání

Topology optimization of fluid flow by using Integer Linear Programming

Autor: Emílio Carlos Nelli Silva, Shahin Ranjbarzadeh, Renato Picelli, L. F. N. Sá, Bruno Campello de Souza, P. V. M. Yamabe

Publikováno v: Structural and Multidisciplinary Optimization. 64:1221-1240

Topology optimization of fluid flow problems is still a challenging open problem, especially when considering turbulence, compressibility, or the addition of different physics. In the current implementation of topology optimization for fluids conside

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5c141f121d32c85405542ee5e1e3bf56
https://doi.org/10.1007/s00158-021-02910-6

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Study on Warpage Behavior and Filler Orientation during Injection Molding

Autor: T. Michii, H. Ohtsuka, M. Seto, M. Yamabe, G. Aoki, Y. Kubota

Publikováno v: International Polymer Processing. 23:419-429

In this study, the warping mechanism was examined in terms of the difference in warpage behavior due to the presence or absence of fiber filler, using a ribbed plate. It was found that the warping mechanism due to anisotropic shrinkage is caused by t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::36600746d534811dc821052a87e8e5f7
https://doi.org/10.3139/217.0064

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Influence of the scattered electrons at the mask in a projection lithography system

Autor: Y. Ishida, K. Naruse, Y. Kojima, M. Sakai, Y. Tomo, Masatoshi Kotera, Akira Yoshida, I. Simizu, M. Yamabe

Publikováno v: Microelectronic Engineering. :247-254

Monte Carlo simulation of electron scattering in the EPL mask is introduced. Firstly, the validity of the results obtained is confirmed by a comparison with experimental result. Secondly, as the application of the simulation, the longitudinal and the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::04443dc295b41bc50998cefbdd0ed388
https://doi.org/10.1016/s0167-9317(01)00526-3

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The influence of the Coulomb interaction effect in the electron beam on the developed resist structure for the projection lithography

Autor: M. Yamabe, Masatoshi Kotera, K. Tamura, Y. Kojima, M. Sakai, Akira Yoshida, I. Simizu, Y. Tomo, K. Yamada

Publikováno v: Microelectronic Engineering. :255-261

A series of simulations are introduced to express the processes of the electron projection lithography quantitatively. It consists of the following three major steps: (1) electron trajectory simulation in an electron beam projection lithography optic

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9d6af14b88684dd2b132288c77a66ee9
https://doi.org/10.1016/s0167-9317(01)00486-5

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Influence of electron acceleration voltage in the cell-projection lithography system

Autor: M. Sakai, K. Matsuoka, Kiyoshi Yamaguchi, Masatoshi Kotera, T. Okagawa, M. Yamabe, K. Naruse, Y. Kojima

Publikováno v: Microelectronic Engineering. 53:353-356

The electron trajectory simulation, considering the Coulomb interaction effect among electrons in the beam in a given electron optical system is performed. The method to obtain the resist pattern width is introduced from the results of the simulation

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4378e028c2093869868bd8b80fe49b69
https://doi.org/10.1016/s0167-9317(00)00332-4

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Quantitative karyotyping of three diploid Brassica species by imaging methods and localization of 45s rDNA loci on the identified chromosomes

Autor: S. Nakayama, Nobuko Ohmido, M. Yamabe, Kiichi Fukui, H. Yoshiaki

Publikováno v: Theoretical and Applied Genetics. 96:325-330

Chromosomes of the three diploid Brassica species, B. rapa (AA), B. nigra (BB) and B. oleracea (CC), were identified based on their morphological characteristics, especially on the condensation pattern appearing at the somatic pro-metaphase stage. Th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d1128bb51fdd628d9d970c32bc616b90
https://doi.org/10.1007/s001220050744

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