Zobrazeno 1 - 2
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pro vyhledávání: '"M. Y. Myl'nikov"'
Autor:
M. Y. Myl'nikov, Vladimir N. Genkin
Publikováno v:
Advances in Resist Technology and Processing XI.
The development processes in microlithography consist in removing of exposure region with rate V exceeding the dissolution rate of unexposed regions. The technology characteristics of the resists are the contrast, the sensitivity and the resolution.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0560e2cefc89c97d3e55eb221d5f1f67
https://doi.org/10.1117/12.175387
https://doi.org/10.1117/12.175387
Autor:
M. Y. Myl'nikov, Vladimir N. Genkin
Publikováno v:
Advances in Resist Technology and Processing X.
In the fabrication of integrated circuits (IC) the solubility dependence of a polymer on its macromolecular length is used. The development process is multistage and involves series thicknesses just as in photo and plasma etching. In lithography this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d15b2cf461f5458a0ce5ee28b16cf9e6
https://doi.org/10.1117/12.154786
https://doi.org/10.1117/12.154786