Zobrazeno 1 - 2
of 2
pro vyhledávání: '"M. W. Legenza"'
Publikováno v:
Optical Microlithography II: Technology for the 1980s.
A discussion of the general parameters used in resist formulation is given. Characterization of the resist and its metal and non-metal developers includes: resist chemistry, coating properties and film thickness control, photospeed at two major wavel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e30edb3fa0b5fadb155d86fa8878abc2
https://doi.org/10.1117/12.935133
https://doi.org/10.1117/12.935133
Publikováno v:
Chemischer Informationsdienst. 11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::044c1e760ec6f695a07ce248eb288750
https://doi.org/10.1002/chin.198001052
https://doi.org/10.1002/chin.198001052