Zobrazeno 1 - 10
of 10
pro vyhledávání: '"M. W. Bench"'
Publikováno v:
Journal of Applied Physics. 87:49-56
The damage produced in GaAs by implantation with low energy heavy ions has been studied as a function of ion mass and implantation temperature (30 and 300 K). The experiments were performed in situ in the microscope-accelerator facility at Argonne Na
Publikováno v:
Philosophical Magazine Letters. 66:39-45
A comparison has been made of the defect image contrast obtained using conventional two-beam dark-field and the bright-field down-zone techniques. It is shown that better resolution and contrast of isolated amorphous zones in GaAs and vacancy loops i
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :458-461
The damage structure produced in GaAs and AlxGa1−xAs(x = 0.85 and 0.20) by heavy-ion irradiations has been investiga using the transmission electron microscope. The irradiations and the electron microscopy were performed at 30 and 300 K in situ usi
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :372-376
The crystalline-to-amorphous transition induced by ion implantation has been investigated in GaAs and GaP using transmission electron microscopy, including experiments performed in situ and with, high-resolution TEM. Implantations have been made with
Publikováno v:
Journal of Applied Physics. 69:1287-1293
The response of AlxGa1−xAs/GaAs samples to bombardment with heavy ions (50 keV Kr+, 50 keV and 1.5 MeV Xe+) was studied as a function of ion dose at temperatures of 30 and 300 K using transmission electron microscopy. Samples with x=0.2 and 0.85 we
Publikováno v:
MRS Proceedings. 235
Isolated amorphous zones produced in GaAs, GaP, Si, and Ge by the implantation of 50 keV Kr+ or Xe+ ions have been induced to recrystallize under the influence of the electron beam in the transmission electron microscope. This effect has been investi
Autor:
M. W. Bench, C.B. Carter
Publikováno v:
Proceedings, annual meeting, Electron Microscopy Society of America. 52:642-643
There has been an increasing interest in recent years in the growth of epitactic oxide thin films for use in a variety of technological applications, including optical and electronic devices. A number of fundamental aspects of the growth of TiO2 film
Publikováno v:
Metallurgical Transactions A. 20:2673-2680
The High-Voltage Electron Microscope (HVEM)-Accelerator Facility at Argonne National Laboratory (ANL) has been used to gain insight into the process of collapse of displacement cascades to vacancy loops in metals (Ni, Cu, Fe, Ni-Si, and Ni-Al) and th
Publikováno v:
MRS Proceedings. 100
Transmission electron microscopy experiments have been performed to investigate the lattice damage created by heavy-ion bombardments in GaAs. These experiments have been performed in situ by using the HVEN - Ion Accelerator Facility at Argonne Nation
Publikováno v:
Proceedings, annual meeting, Electron Microscopy Society of America. 46:460-461
Transmission electron microscopy experiments have been performed to investigate the lattice damage created by heavy-ion bombardments in GaAs. These experiments were undertaken to provide additional insight into the mechanisms by which individual amor