Zobrazeno 1 - 10
of 64
pro vyhledávání: '"M. Raaif"'
Publikováno v:
Discover Materials, Vol 4, Iss 1, Pp 1-14 (2024)
Abstract In order to enhance the tribological and corrosion properties of AISI 316 substrate, rf plasma carbonitriding was involved to form a carbonitrided layer on AISI 316 base substrate. The deposition of TiN top layer was executed engaging titani
Externí odkaz:
https://doaj.org/article/9bb4b280ebf4451a85b9b038ef5fae59
Akademický článek
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Publikováno v:
Journal of Electronic Materials. 50:4933-4944
The optoelectronic characteristics and surface plasmon polaritons (SPPs) of nanostructured CdO/Ag/CdO multilayer films prepared by DC pulsed magnetron sputtering were inspected. The multilayer films were deposited with different Ag metallic interlaye
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Publikováno v:
Journal of Electronic Materials. 50:2699-2709
The effect of interference on the optoelectronic properties of TiO2/Cu/TiO2 multilayers deposited by DC pulsed magnetron sputtering was scrutinized. The TCT multilayers were arranged with different thicknesses of the Cu metallic interlayer. The outco
Publikováno v:
Chinese Journal of Physics. 68:168-177
Low-pressure plasma of gas mixture of Ar, O2 and N2 generated by RF magnetron sputtering was characterized by Langmuir probe and optical emission spectroscopy (OES). The electron temperature (Te), ion density (ni) and electron energy distribution fun
Publikováno v:
Acta Physica Polonica A. 137:1068-1074
Autor:
M. Hammad Fawey, M. Abo El-Kassem, A.M. Abd El-Rahman, M. Raaif, Ronghua Wei, F.M. El-Hossary
Publikováno v:
Journal of Materials Engineering and Performance. 29:3324-3333
To optimize the tribo-mechanical performance of thick Ti-Si-CN nanocomposite coatings for a wide range of harsh industrial applications, reactive gases of nitrogen and trimethylsilane were employed with specific flow rates of PEMS process. Plasma-enh
Publikováno v:
Journal of the Australian Ceramic Society. 56:1155-1165
Owing to the desired mechanical and biomedical characteristics of TiN-based coatings and the encourage features of pulsed magnetron sputtering, the current study was conducted to deposit Ti-Al-N thin film on AISI 316 using DC pulsed magnetron sputter
Publikováno v:
ECS Journal of Solid State Science and Technology. 11:085011
In this study, ZrO2/Cu/ZrO2 nanostructured multilayers were constructed on glass substrates with diverse Cu interlayer thickness (5–25 nm) employing pulsed DC magnetron sputtering. The optoelectronics and structural characteristics of the multilaye