Zobrazeno 1 - 10
of 23
pro vyhledávání: '"M. N. Charasse"'
Publikováno v:
Journal of Applied Physics. 68:937-942
Cathodoluminescence and electron beam induced current are used to investigate the degradation of the graded‐index separate‐confining heterostructure laser devices grown on silicon substrates. By examining the evolution of the microscopic electron
Publikováno v:
Journal of Electronic Materials. 19:567-573
The growth of GaAs on patterned Si substrates is essential for the integration of GaAs and Si devices. Moreover this growth may have to be done in wells to planarize the surfaces of the Si and GaAs devices for their interconnection. In this study, Ga
Publikováno v:
Thin Solid Films. 184:429-436
AlGaAs/GaAs multiquantum-well (MQW) structures deposited on Si(001) substrates misoriented by 4° toward 〈110〉 have been fabricated by molecular beam epitaxy (MBE) and a combination of organo-metallic chemical vapour deposition (OMCVD) and MBE. S
Publikováno v:
Applied Physics Letters. 61:766-768
We show that x‐ray photoemission diffraction can be used as a means of detection of antiphase domains in the epitaxial growth of polar compounds on nonpolar substrates. An example is given in the case of the GaAs growth on a patterned (001) Si subs
Publikováno v:
Applied Physics Letters. 60:350-352
Photoluminescence experiments have been carried out on erbium doped Ga0.55Al0.45As under continuous wave and pulsed laser excitation. For the first time the emissions arising from the two first Er3+ excited states 4I11/2, 4I13/2 and their temperature
Publikováno v:
Applied Physics Letters. 58:2132-2134
Time‐resolved photoluminescence (PL) spectroscopy has been performed on erbium‐doped Ga0.55Al0.45As. We have investigated the 4I13/2→4I15/2 optical transition. The measured fluorescence lifetime is around 1.2 ms which is similar to values found
Publikováno v:
Journal de Physique Colloques
Journal de Physique Colloques, 1990, 51 (C1), pp.C1-915-C1-920. ⟨10.1051/jphyscol:19901144⟩
Journal de Physique Colloques, 1990, 51 (C1), pp.C1-915-C1-920. ⟨10.1051/jphyscol:19901144⟩
The threading defects involved in the GaAs/Si heterostructure have been studied in as-grown and annealed specimens. Their origin is related to the imperfections of the interface : impurities, roughness and discontinuities of misfit dislocation networ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d1291d8490f97cd648cdcd8afe02bfe2
https://hal.archives-ouvertes.fr/jpa-00230056
https://hal.archives-ouvertes.fr/jpa-00230056
Publikováno v:
Physical Review B. 31:8298-8301
Publikováno v:
Ultramicroscopy. 25:31-34
Si (KLL) Auger linescans across a GaAs/Si chemical edge (bulk sample) have been obtained at a 100 keV primary beam energy. A line resolution of 8 nm has been deduced from the FWHM measurement of the first derivative of the experimental profile. Sampl
Publikováno v:
Journal of Applied Physics. 58:3373-3376
We analyze in this paper the effect of thermal treatment on structural properties of GaAs/InGaAs strained‐layer superlattices grown by molecular beam epitaxy. The superlattices are analyzed using double‐crystal x‐ray rocking curves. In order to