Congenital Diarrhea and Cholestatic Liver Disease: Phenotypic Spectrum Associated with MYO5B Mutations

Autor: S Ünal, J Koeglmeier, M Meissl, H Ayyıldız Civan, J Melek, T Siahanidou, A M Demir, Patrick Gerner, J H Montoya, Duba H-C., Denise Aldrian, A Koutroumpa, Sahar Mansour, Michael W. Hess, Murat Cakir, Georg F. Vogel, Thomas Müller, J Hornova, T K Frey, Aysel Ünlüsoy Aksu, Y Rachman, Ekkehard Sturm, Andreas R. Janecke, G Düker, M Miqdady, Lukas A. Huber, R Lima, Frank M. Ruemmele, Carsten Posovszky, J Hertecant, Holm H. Uhlig, E Ramos Boluda, Stefan Wirth, Raffi Lev-Tzion, C Deppisch, R Lanzersdorfer, Merit M. Tabbers, Simone Kathemann, Yaron Avitzur

Publikováno v: Journal of Clinical Medicine, Vol 10, Iss 481, p 481 (2021)
Journal of clinical medicine, 10(3):481, 1-15. Multidisciplinary Digital Publishing Institute (MDPI)
Journal of Clinical Medicine
Volume 10
Issue 3

Myosin Vb (MYO5B) is a motor protein that facilitates protein trafficking and recycling in polarized cells by RAB11- and RAB8-dependent mechanisms. Biallelic MYO5B mutations are identified in the majority of patients with microvillus inclusion diseas

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8a378cf582516dca7504ff713f219f8f
https://www.mdpi.com/2077-0383/10/3/481

Template fabrication schemes for step and flash imprint lithography

Autor: K. Gehoski, M. Meissl, William J. Dauksher, D. J. Resnick, Sidlgata V. Sreenivasan, Eric S. Ainley, Matthew E. Colburn, Jeffrey H. Baker, Byung Jin Choi, David P. Mancini, Kevin J. Nordquist, John G. Ekerdt, Todd Bailey, Carlton G Willson, A. Alec Talin, S. Johnson

Publikováno v: Microelectronic Engineering. :461-467

Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay technique

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4fec9cc2beffe5dd4280a7a15270638a
https://doi.org/10.1016/s0167-9317(02)00462-8

Precision Flexure Mechanisms in High Speed Nanopatterning Systems

Autor: Byung Jin Choi, Sidlgata V. Sreenivasan, M. Meissl

Publikováno v: Advances in Mechanisms, Robotics and Design Education and Research ISBN: 9783319003979

Semiconductor wafer nanolithography machines integrate nano-scale precision mechanisms with advanced optical and mechatronic modules to achieve highly controlled nanopatterning capability for fabricating advanced integrated circuits, photonics, and o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c0d36f02f6f265ba8311add553ef83b8
https://doi.org/10.1007/978-3-319-00398-6_10

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