Zobrazeno 1 - 10
of 23
pro vyhledávání: '"M. M. Rozhavskaya"'
Autor:
M. M. Rozhavskaya, L. M. Sorokin, A. V. Myasoedov, S. I. Troshkov, A. F. Tsatsul’nikov, V. V. Lundin, A. V. Osipov, S. A. Kukushkin
Publikováno v:
Physics of the Solid State. 57:1899-1907
This paper presents the results of the electron microscopic study of GaN/AlGaN/AlN/SiC/Si(111) structures grown by the metal-organic vapor phase epitaxy. A SiC epitaxial buffer nanolayer has been grown by a new method of substitution of atoms on the
Publikováno v:
physica status solidi (a). 212:851-854
We present a method for determining the diffusion lengths of Ga adatoms on GaN by combining profiling of the tops of GaN stripes obtained by selective area MOCVD and a diffusion growth model. We deduce very high values of the diffusion lengths on top
Autor:
V. V. Lundin, V. Yu. Davydov, M. A. Yagovkina, Alexander N. Smirnov, V. V. Ratnikov, M. M. Rozhavskaya, M. P. Shcheglov, E. E. Zavarin, R. N. Kyutt
Publikováno v:
Crystallography Reports. 58:953-958
The structure of short-period hexagonal GaN/AlN superlattices (SLs) has been investigated by X-ray diffraction. The samples have been grown by metalorganic vapor-phase epitaxy (MOVPE) in a horizontal reactor at a temperature of 1050°C on (0001)Al2O3
Autor:
V. V. Lundin, S. I. Troshkov, M. M. Rozhavskaya, A. F. Tsatsul’nikov, Pavel N. Brunkov, E. E. Zavarin
Publikováno v:
Semiconductors. 47:437-442
The influence of the carrier gas, trimethylgallium flow, and growth time on the character of the selective epitaxy of GaN in stripe windows oriented along the crystallographic direction 〈 $\bar 1$ 100〉 GaN for various widths of the mask between t
Autor:
M. M. Rozhavskaya, W. V. Lundin, Pavel N. Brunkov, S. I. Troshkov, E. E. Zavarin, Andrey E. Nikolaev, Andrey F. Tsatsulnikov
Publikováno v:
physica status solidi c. 10:373-376
In this study we investigate the possibility of a-GaN ELOG process and its peculiarities for stripes of various orientations. It is shown that stripe orientation allows governing such important parameters of ELOG-process as lateral growth rate, voids
Autor:
M. M. Rozhavskaya, W. V. Lundin, Valery Yu. Davydov, Mariya A. Yagovkina, Pavel N. Brunkov, E. E. Zavarin, S. I. Troshkov, E. Y. Lundina, Andrey F. Tsatsulnikov
Publikováno v:
physica status solidi c. 10:441-444
In this paper we obtained GaN and InGaN nanowires on AlN/Si (111) templates via pulsed Metal Organic Chemical Vapour Deposition (MOCVD). The growth modes were investigated, in which selective growth is possible. The impact of NH3 flow and TMG flow an
Autor:
M. M. Rozhavskaya, R. N. Kyutt, W. V. Lundin, V. Yu. Davydov, E. E. Zavarin, Mikhail B. Smirnov, M. A. Yagovkina, Alexander N. Smirnov, Evgenii M. Roginskii, Yu. E. Kitaev
Publikováno v:
physica status solidi (a). 210:484-487
We report on the first observation of folded acoustic phonons in the Raman spectra of short-period AlN/GaN superlattices (SLs). The values of longitudinal and transverse sound velocities along the [0001] direction of SL were estimated. It is shown th
Autor:
W. V. Lundin, Pavel N. Brunkov, Andrey E. Nikolaev, M. A. Yagovkina, M. M. Rozhavskaya, Roman Talalaev, A.V. Lobanova, A. F. Tsatsul’nikov, D. Yu. Kazantsev, B. Ya. Ber
Publikováno v:
Journal of Crystal Growth. 352:209-213
Possibility of AlN growth by MOVPE in a planetary reactor with high growth rate was investigated. Growth was performed on (0001) Al2O3 substrates at the reactor pressure of 100 mbar. It was shown that deposition rate is close to diffusion limit at lo
Publikováno v:
Technical Physics Letters. 37:735-738
Specific features of gallium nitride (GaN) selective growth by MOVPE in round windows has been studied. It is established that a decrease in the flux of ammonia results in an increase in the lateral size of crystallites, while the minimum studied flu
Autor:
Alexander N. Smirnov, A. V. Sakharov, W. V. Lundin, V. Yu. Davydov, S. I. Troshkov, M. M. Rozhavskaya, E. Yu. Lundina
Publikováno v:
Technical Physics Letters. 40:372-374
The possibilities of a new method of growing gallium nitride nano- and microwire crystals using continuous titanium films with a thickness of 10–30 nm during growth are described. It is shown that this method can provide growth of high-quality GaN