Zobrazeno 1 - 2
of 2
pro vyhledávání: '"M. L. O'Neil"'
Publikováno v:
Surface and Coatings Technology. 200:3127-3133
Resistance of low dielectric constant (low- k ) dielectrics, deposited using Diethoxymethylsilane (DEMS) precursor and helium (He) carrier gas with or without oxygen (O 2 ) reaction gas, against heat, moisture stress and chemical treatment is clarifi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b969c841ad687201bf2b9efa3047026e
https://doi.org/10.1016/j.surfcoat.2005.07.014
https://doi.org/10.1016/j.surfcoat.2005.07.014
Autor:
Chyung Ay, M. L. O'Neil, Yi-Lung Cheng, You-Lin Wu, Ying-Lang Wang, M. S. Feng, J. K. Lan, Chee-Wee Liu, Chuan-Pu Liu
Publikováno v:
Thin Solid Films. :681-687
The low dielectric constant (low-k) of organo-silica-glass (OSG) and fluorine-incorporated OSG (OFSG) materials produced from plasma-enhanced chemical vapor deposition of trimethylsilane are thermally stable to greater than 600 °C. FTIR analysis ind
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c44c2df514d76af10259bbbf97cd584
https://doi.org/10.1016/j.tsf.2003.09.006
https://doi.org/10.1016/j.tsf.2003.09.006