Zobrazeno 1 - 3
of 3
pro vyhledávání: '"M. K. Gusejnov"'
Publikováno v:
Вестник Дагестанского государственного технического университета: Технические науки, Vol 38, Iss 3, Pp 15-20 (2016)
Method of magnetron sputtering targets polycrystalline SiC-AlN on substrates SiC and Al2O3 thin films received solid solutions (SiC)1-x(AlN)x. The methods of Xray and electron microscopy studies the structure and composition of films. There are facto
Externí odkaz:
https://doaj.org/article/9de1b5e0a6d244f7acf0010c30291bed
Publikováno v:
Vestnik Dagestanskogo Gosudarstvennogo Tehničeskogo Universiteta: Tehničeskie Nauki, Vol 38, Iss 3, Pp 15-20 (2016)
Method of magnetron sputtering targets polycrystalline SiC-AlN on substrates SiC and Al2O3 thin films received solid solutions (SiC)1-x(AlN)x. The methods of Xray and electron microscopy studies the structure and composition of films. There are facto
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::861e4e20da58a067153c9a29bf602b65
https://doi.org/10.21822/2073-6185-2015-38-3-15-20
https://doi.org/10.21822/2073-6185-2015-38-3-15-20
Publikováno v:
Semiconductors. 44:812-815
The results of theoretical estimations of important parameters of the process of magnetron-assisted sputtering are reported. The parameters are the extent of the zone of thermalization of atoms and the distance from the target to the conditional anod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::079171727ef2f7aa695cb98638611d6b
https://doi.org/10.1134/s1063782610060217
https://doi.org/10.1134/s1063782610060217