Zobrazeno 1 - 4
of 4
pro vyhledávání: '"M. J. McGeary"'
Autor:
Marc Schaekers, Marc Heyns, Bert Vermeire, M. J McGeary, Hessel Sprey, Marc Meuris, Paul Mertens, M. Depas
Publikováno v:
Scopus-Elsevier
The present study reviews the use of Cl in gate oxidation furnaces for growth of high quality gate oxides with a thickness in the range of 2 to 15 1nm. The following, commercially available, “state of the art” Cl-precursors have been tested: 1,1,
Publikováno v:
ChemInform. 21
Publikováno v:
Organometallics. 7:271-279
Publikováno v:
Organometallics. 4:2102-2106