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Autor:
J. Li, I. Tezsevin, M. J. M. Merkx, J. F. W. Maas, W. M. M. Kessels, T. E. Sandoval, A. J. M. Mackus
Publikováno v:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 40(6):062409. AVS Science and Technology Society
Area-selective atomic layer deposition (ALD) is of interest for applications in self-aligned processing of nanoelectronics. Selective deposition is generally enabled by functionalization of the area where no growth is desired with inhibitor molecules