On the possibility of synthesizing multilayered coatings in the (Ti,Al)N system by RGPP: A microstructural study

Autor: Thierry Cabioc’h, Frédéric Pailloux, C. Rousselot, P. Henry, M.-J. Pac, G. Amiard, M.-H. Tuilier, D. Eyidi, A. El Mouatassim

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2019, 374, pp.845-851. ⟨10.1016/j.surfcoat.2019.06.071⟩
Surface and Coatings Technology, 2019, 374, pp.845-851
Surface and Coatings Technology, 2019, 374, pp.845-851. ⟨10.1016/j.surfcoat.2019.06.071⟩

International audience; Radiofrequency magnetron sputtering combined with reactive gas pulsing process was used to synthesize two titanium aluminum nitride multilayer films using a periodically controlled nitrogen flow rate changing from 0.4 to 1 scc

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1671e112e2cf2615f3dca388c041893d
https://hal.archives-ouvertes.fr/hal-02953192

The competitive growth of cubic domains in Ti1–xAlxN films studied by diffraction anomalous near-edge structure spectroscopy

Autor: Christophe Rousselot, Y. Pinot, M.-H. Tuilier, D. Thiaudière, M.-J. Pac

Publikováno v: Journal of Synchrotron Radiation. 22:1440-1449

Titanium and aluminium nitride films deposited by magnetron sputtering generally grow as columnar domains made of oriented nanocrystallites with cubic or hexagonal symmetry depending on Al content, which are embedded in more disordered grain boundari

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b7240d5a53ce8d94ecbed98f2c21eb2c
https://doi.org/10.1107/s160057751501632x

Investigation of Ti 0.54 Al 0.46 /Ti 0.54 Al 0.46 N multilayer films deposited by reactive gas pulsing process by nano-indentation and electron energy-loss spectroscopy

Autor: Y. Pinot, Christophe Rousselot, Sylvain Giljean, Patrick Delobelle, M.-H. Tuilier, M.-J. Pac, Corinne Ulhaq-Bouillet

Publikováno v: Thin Solid Films
Thin Solid Films, Elsevier, 2017, 634, pp.96-106

International audience; Physical vapour deposition technology iswell suited to the deposition of advanced TiAlN-based coatings. Among these thin films, multilayer systems consisting of stacked layers of metallic Ti1−xAlx and nitride Ti1−xAlxNwith

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::339a316a0a79a4181d4f45e868202704
https://hal.archives-ouvertes.fr/hal-02131468

Nano-structured titanium and aluminium nitride coatings: Study by grazing incidence X-ray diffraction and X-ray absorption and anomalous diffraction

Autor: M.-J. Pac, Denis V. Anokhin, Christophe Rousselot, M.-H. Tuilier, D. Thiaudière, Dimitri A. Ivanov

Publikováno v: Thin Solid Films. 526:269-273

Titanium and aluminium nitride thin films, Ti 1 − x Al x N (x = 0, x = 0.5, x = 0.68), deposited by reactive magnetron sputtering on silicon substrates are investigated by combining two different X-ray diffraction experiments carried out using sync

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::515151bdf927ba8c60a39d2cfcf76042
https://doi.org/10.1016/j.tsf.2012.10.120

Structure of clean and H-saturated epitaxial two-dimensional Er silicide on Si(111) studied by SEXAFS

Autor: M. H. Tuilier, Candido Pirri, P. Wetzel, Dominique Berling, D. Bolmont, G. Gewinner

Publikováno v: Surface Science. 555:94-100

The atomic structure of H-saturated epitaxial two-dimensional (2D) Er silicide on Si(1 1 1) has been studied by means of surface-extended X-ray absorption fine structure. This structure consists of a single hexagonal erbium plane intercalated between

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::438f52faf2b262477f9d3d471d8bff4d
https://doi.org/10.1016/j.susc.2004.02.023