Zobrazeno 1 - 10
of 30
pro vyhledávání: '"M. G. R. Thomson"'
Publikováno v:
CICC
Publikováno v:
Journal of Applied Physics. 81:461-465
The energy distributions of electron emission from a Schottky emitter have been studied at tip temperatures from 1450 to 1800 K and angular current densities from 0.1 to 240 μA/sr. We have observed broadening of the energy distribution, with increas
Publikováno v:
Microelectronic Engineering. 13:151-156
Achieving 0.25μm performance in a shaped electron beam tool has required not only enhancements to hardware and software, but also refined techniques for optimizing and monitoring resist image quality and spot placement accuracy. A compact test patte
Autor:
E. Kratschmer, Tai-Hon Philip Chang, M. G. R. Thomson, H.S. Kim, S. A. Rishton, M. L. Yu, Kim Y. Lee
Publikováno v:
IVMC '95. Eighth International Vacuum Microelectronics Conference. Technical Digest (Cat. No.TH8012).
Summary form only given. Highly miniaturized electron beam columns based on a field emission source and microfabricated electron optical components have been developed. A 1 keV microcolumn operating with a miniaturized Zr/O/W Schottky emitter has bee
Autor:
Hyun-Chul Kim, M. L. Yu, E. Kratschmer, Kim Y. Lee, S. A. Rishton, M. G. R. Thomson, Tai-Hon Philip Chang, Dieter P. Kern
Publikováno v:
SPIE Proceedings.
A fully functional electron beam microcolumn, 3.5 mm in length, demonstrating a probe size of 10 nm and beam current >= 1 nA at 1 keV has been successfully developed. This paper presents its current status and future directions. Potential application
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2284
Experimental measurements of emission stability and energy distributions from a Schottky emitter have been conducted at a tip temperature range from 1330 to 1800 K. The changes of emission properties have been observed at reduced tip temperatures. No
Autor:
B. W. Hussey, E. Kratschmer, S. Zolgharnain, Kam-Leung Lee, M. L. Yu, M. G. R. Thomson, Ho-Seob Kim, Tai-Hon Philip Chang, S. A. Rishton
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3774
Lithography with an array of miniaturized scanning electron‐beam columns presents one of the most promising high‐throughput possibilities for fabrication of devices with feature sizes less than 100 nm. With scanning electron beams no mask is requ
Autor:
Tai-Hon Philip Chang, S. A. Rishton, B. W. Hussey, S. Zolgharnain, M. G. R. Thomson, M. L. Yu, Ho-Seob Kim, E. Kratschmer, Kam-Leung Lee
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3792
A miniaturized 1 kV electron beam column with a 20×20 mm square footprint for application in arrayed lithography was developed. The actual beam forming optics measured from the electron emitter to the last electrode in the beam focusing Einzel lens
Autor:
M. G. R. Thomson
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3802
The designs of the deflector and the final focusing lens in microcolumns are constrained by the extremely small physical size, and by the low energy of the beam. Because the overall column size and working distance are much smaller, the diameter of t
Autor:
M. G. R. Thomson
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 13:2455
A conventional field‐emission electron gun consists of a pointed cathode and an extraction electrode at a positive potential which produces a strong electric field at the cathode surface. Electrons are field‐emitted from the cathode, pass through