Zobrazeno 1 - 3
of 3
pro vyhledávání: '"M. E. Ware"'
Publikováno v:
Frontiers in Materials, Vol 7 (2020)
A remote plasma enhanced chemical vapor deposition (CVD) process using GeH4, SiH4, and SnCl4 precursors has been developed for epitaxial growth of group-IV alloys directly on Si (100) substrates, without the need for buffer layers. X-ray diffraction
Externí odkaz:
https://doaj.org/article/7fa9e65356a54fce945e970712fc74f5
Publikováno v:
Madroño. 66:11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d5c0095777829fd6c6734d5a02f00cc
https://doi.org/10.3120/0024-9637-66.1.11
https://doi.org/10.3120/0024-9637-66.1.11
Publikováno v:
The American journal of psychology. 79(3)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::55e91e4e176a066b73bd02cd0e5adfbd
https://pubmed.ncbi.nlm.nih.gov/5968483
https://pubmed.ncbi.nlm.nih.gov/5968483