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pro vyhledávání: '"M. D. Strikovski"'
Autor:
F. Kahlmann, Jürgen Schubert, Chun-Lin Jia, Willi Zander, M. D. Strikovski, V.N. Glyantsev, G. Ockenfuss
Publikováno v:
Applied Physics Letters. 66:3521-3523
A novel microshadow mask technique for in situ patterning of multilayers is presented. It is ideally suited to fabricate YBa2Cu3Ox(YBCO) and insulator lines with gently sloping edges, needed for high quality insulated superconducting crossovers. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f8edc89a10b312c4e76b804c50ef351
https://doi.org/10.1063/1.113784
https://doi.org/10.1063/1.113784
