Zobrazeno 1 - 6
of 6
pro vyhledávání: '"M. D. Nijkerk"'
Publikováno v:
Mazuray, L.Wartmann, R.Wood, A.P., Proceedings Optical Systems Design 2015, Optical Design and Engineering VI, 7 September 2015, Jena, Germany
The fact that every spectrometer can sort light by wavelength at the speed of light is intriguing. The field of spectrometry is a long-existing and ever-changing one. The application areas extend from optical communication to possible extraterrestria
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e5ebd80ad30d9782ed01191e81109b55
http://resolver.tudelft.nl/uuid:8b0692b7-5457-429f-937a-6199fdc5d3a6
http://resolver.tudelft.nl/uuid:8b0692b7-5457-429f-937a-6199fdc5d3a6
Autor:
M. D. Nijkerk, P. Kruit
Publikováno v:
Journal of Applied Physics, 5, 96, 2985-2989
A Monte Carlo simulation tool, which was used to evaluate the influence of discrete space charge effects on self-consistent calculations of cathode-ray tube optics, was discussed. It was found that interactions in the space charge cloud affect the el
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fe221c3bc4b2b796848762b02de98faf
https://doi.org/10.1063/1.1777395
https://doi.org/10.1063/1.1777395
Publikováno v:
International Conference on Space Optics, ICSO 2010, 4-8 October 2010, Rhodes, Greece
A freeform optical surface is typically defined as any surface that does not have an axis of rotational symmetry. These surfaces provide additional degrees of freedom that can lead to improved performance compared to systems that make use solely of c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c16dd247aecf8937f7514c8b6175963f
http://resolver.tudelft.nl/uuid:e7e44bec-07bc-4d7a-9245-cb651c1aabd1
http://resolver.tudelft.nl/uuid:e7e44bec-07bc-4d7a-9245-cb651c1aabd1
Autor:
George P. Patsis, Evangelos Gogolides, Leonardus H. A. Leunissen, George Kokkoris, M. D. Nijkerk, Ioannis Raptis, D. Drygiannakis
Publikováno v:
SPIE Proceedings.
Device shrinking combined with material manipulation under various process conditions becomes a difficult task if specific optimization conditions should be met. Nanolithography is limited by effects as line-edge and line-width roughness (LER and LWR
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4f501762031a3dd416c75bdeff34d93
https://doi.org/10.1117/12.708847
https://doi.org/10.1117/12.708847
Publikováno v:
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 6, 25, 2521-2525
A new concept for high throughput defect detection with multiple parallel electron beams is described. As many as 30 000 beams can be placed on a footprint of a in.2, each beam having its own microcolumn and detection system without cross-talk. Based
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::96d0e1f7a73a247fa087dcfd3566408c
http://resolver.tudelft.nl/uuid:b50c9362-4157-42da-8627-f2601e3d5f25
http://resolver.tudelft.nl/uuid:b50c9362-4157-42da-8627-f2601e3d5f25
Publikováno v:
International Journal of Computational Science and Engineering. 2:134
Sub-100 nm device fabrication rules require extremely tight control of Line-Edge Roughness (LER) of patterned structures. During lithographic processes the resist film introduces an initial LER due to its chemical structure and processing. This initi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::625e35c0c7462a202120deb4cd6daa53
https://doi.org/10.1504/ijcse.2006.012765
https://doi.org/10.1504/ijcse.2006.012765