Zobrazeno 1 - 4
of 4
pro vyhledávání: '"M. D. Alvey"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:2253-2260
Samples of the Engel–Brewer intermetallic compounds ZrPt3 and HfIr3 are characterized by x‐ray photoelectron spectroscopy (XPS) after in vacuo exposure to oxygen, water vapor, and hydrogen at temperatures ranging from 300 to 1700 K. Results from
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c85b1937d9bbd6763eeb17057bcde2e
https://doi.org/10.1116/1.577927
https://doi.org/10.1116/1.577927
Publikováno v:
The Journal of Chemical Physics. 89:570-576
It is shown that alkali adatoms coadsorbed in the presence of adsorbed hydrogen on Ni(111) can cause a large increase in the cross section for H+ emission during electron stimulated desorption. This phenomenon was investigated using the digital ESDIA
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9b8f1eb756fdab6f9bb436caeb61a16
https://doi.org/10.1063/1.455447
https://doi.org/10.1063/1.455447
Publikováno v:
ChemInform. 19
It is shown that alkali adatoms coadsorbed in the presence of adsorbed hydrogen on Ni(111) can cause a large increase in the cross section for H+ emission during electron stimulated desorption. This phenomenon was investigated using the digital ESDIA
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e136cf334aed7a0ebf67dfc16d4c21dc
https://doi.org/10.1002/chin.198840023
https://doi.org/10.1002/chin.198840023
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 3:1631-1632
Using electron impact, we have converted NH3(ads) to NH2(ads) on the Ni(110) surface. Below 300 K, NH3 is bound nondissociatively to Ni ridge atoms on Ni(110) by electron donation from lone pair N electrons. Upon electron bombardment, the process NH3
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25a414fb32501db655d8adf71bb4e52c
https://doi.org/10.1116/1.573149
https://doi.org/10.1116/1.573149