Zobrazeno 1 - 3
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pro vyhledávání: '"M. C. Luche"'
Autor:
M. C. Luche, J. Guillan, Sonarith Chhun, P. Normandon, E. Petitprez, Lucile Arnaud, K. Haxaire, E. Richard, C. Monget, D. Galpin
Publikováno v:
Microelectronic Engineering. 88:697-700
Two seed deposition hardware are compared in this paper: a standard Self Ionized Plasma (SIP) standard chamber and a new generation chamber allowing Cu deposition and re-sputtering simultaneously. TEM characterizations exhibits better features covera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::401122ea0f103eb2d28de83c4e50ef30
https://doi.org/10.1016/j.mee.2010.07.035
https://doi.org/10.1016/j.mee.2010.07.035
Publikováno v:
2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
For mature technologies, main yield detractor is random defectivity. Nevertheless, some devices present higher defectivity than rest of devices. Out of process accident, design related defect is one of suspected root cause. Also, design-based defect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c17bf0bde602b0e445c9c4c83f97ec0
https://doi.org/10.1109/asmc.2009.5155943
https://doi.org/10.1109/asmc.2009.5155943
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