Zobrazeno 1 - 10
of 58
pro vyhledávání: '"M. Baciocchi"'
Publikováno v:
Annales medico-psychologiques. 118
Autor:
F. Fontana, L. Grella, M. Baciocchi, E. Di Fabrizio, L. Mastrogiacomo, Massimo Gentili, F. Vaninetti
Publikováno v:
Microelectronic Engineering. :121-124
This paper addresses the fabrication issues related to phase masks for photonics applications. A commercial e-beam lithography system operating at 50 kV is used to pattern a suitable resist on a fused silica substrate; the printed image is then trans
Autor:
Massimo Gentili, L. Grella, Sang-Soo Choi, M. Baciocchi, L. Mastrogiacomo, Hai Bin Chung, E. Di Fabrizio, Hyung Joun Yoo, Young Jin Jeon
Publikováno v:
Microelectronic Engineering. 35:553-556
The investigated X-ray steppers Karl Suss XRS 200/1 and XRS 200/3 use an optical alignment system for adjusting the parallelism, for gap setting and alignment between mask and wafer. In general the optical signal, when mask and wafer are at gap dista
Publikováno v:
Microelectronic Engineering. 35:495-498
In this paper we present two important issues often demanded when patterning DOEs using EBL: the first one is the attainment of accurate resist three-dimensional shaping to increase DOE efficiency, this task is accomplished by developing a new proxim
Exposure latitude and CD control study for additively patterned X-ray mask with GBit DRAM complexity
Autor:
Hai Bin Chung, L. Grella, Hyung Joun Yoo, M. Baciocchi, Sang-Soo Choi, E. DiFabrizio, L. Mastrogiacomo, Massimo Gentili, Young Jin Jeon, L. Maggiora, D. Peschiaroli
Publikováno v:
Microelectronic Engineering. 30:195-198
40 kV electron beam lithography has been used to pattern gold plated x-ray masks containing GBit DRAM complexity layouts. The two commercial e-beam resists used, namely PMMA and SAL 601, both showed 0.12 μm resolution capability in dense and large l
Autor:
L. Grella, R. Maggiora, E. Di Fabrizio, L. Mastrogiacomo, Massimo Gentili, Ioannis Raptis, M. Baciocchi
Publikováno v:
Microelectronic Engineering. 27:417-420
In this paper it is presented a study on the process optimization for an e-beam sensitive commercial chemically amplified negative resist, the Shipley SAL 601-ER 7, used for fabrication of gold X-ray masks with CD down to 0.15 @mm and complexity equi
Publikováno v:
Microelectronic Engineering. 23:101-104
We developed a complete system for fabrication of Zone Plates (ZPs) for soft x-rays covering all steps from design to absorber growth and to automatic dimensional inspection and final tests. The design phase is carried out by a custom software optimi
Autor:
Barry P. Lai, L. Grella, E. DiFabrizio, V. White, S. Bajikar, M. Baciocchi, D. Denton, Wenbing Yun, Franco Cerrina, Y. H. Xiao, Dan G. Legnini, John J. Chrzas
Publikováno v:
Microelectronic Engineering. 21:99-102
Autor:
Massimo Gentili, L. Grella, Franco Cerrina, G. Meneghini, Q. Leonard, D. Plumb, R. Kumar, M. Baciocchi
Publikováno v:
Microelectronic Engineering. 17:551-554
First and second order gratings for 1.55 μm distributed feed-back lasers (DFB) have been fabricated in InP using synchrotron radiation proximity lithography . High resolution X-ray masks with 1 st and 2 nd order DFB laser gratings were fabricated by
Publikováno v:
Microelectronic Engineering. 17:171-174
In this paper the use of a commercial electron beam lithography machine (Leica Cambridge EBMF 10 cs/120) is presented as an inspection tool for the control and the metrology of X-ray masks with absorber dimensions down to 100 nm. Isolated gold absorb