Zobrazeno 1 - 10
of 60
pro vyhledávání: '"M. Audronis"'
Autor:
Allan Matthews, Adrian Leyland, Eduardo Rodríguez, O Jimenez, K. Kanakis, M. Flores, M. Audronis
Publikováno v:
Thin Solid Films. 591:149-155
Hard, partly amorphous, ZrTiB(N) coatings were deposited by Physical Vapour Deposition (PVD) onto (111) silicon wafers at low substrate temperatures of 85 and 110 °C using Closed Field Unbalanced Magnetron Sputtering. A segmented rectangular sputter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69354389b9b11491c4899080a6891c81
https://doi.org/10.1016/j.tsf.2014.05.015
https://doi.org/10.1016/j.tsf.2014.05.015
Publikováno v:
Vacuum. 107:159-163
Target voltage ( V T ) feedback-based closed-loop gas flow control is one of the most cost-effective and well-known methods to regulate reactive oxide thin film sputtering processes. However, it can be difficult to perform due to target voltage non-l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e9000546a6c9913b3275b9f9462411f
https://doi.org/10.1016/j.vacuum.2014.04.025
https://doi.org/10.1016/j.vacuum.2014.04.025
Autor:
M. Audronis, Kęstutis Juškevičius, Andrius Subacius, Ramutis Drazdys, Allan Matthews, Adrian Leyland, R. Juškėnas
Publikováno v:
Applied Physics A. 116:1229-1240
ZrO2 exhibits low optical absorption in the near-UV range and is one of the highest laser-induced damage threshold (LIDT) materials; it is, therefore, very attractive for laser optics applications. This paper reports explorations of reactive sputteri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc8331139bf7632b29a6794ad9e0d7d1
https://doi.org/10.1007/s00339-013-8214-1
https://doi.org/10.1007/s00339-013-8214-1
Publikováno v:
Thin Solid Films. 520:1571-1574
This paper reports preliminary results of industrial size (152 mm target O.D.) rotatable magnetron sputtering of Al target in direct current (DC) and High Power Impulse Magnetron Sputtering (HIPIMS) modes using two standard commercially available mag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d37ee4ab100b70cbc86fc0e57d7bd137
https://doi.org/10.1016/j.tsf.2011.10.042
https://doi.org/10.1016/j.tsf.2011.10.042
Autor:
D. Bussey, Allan Matthews, V. Bellido-Gonzalez, Steven J. Hinder, Mark A. Baker, P. Mack, M. Audronis
Publikováno v:
Thin Solid Films. 520:1564-1570
PET web samples have been treated by magnetically enhanced glow discharges powered using either medium frequency pulse direct current (p-DC) or low frequency high power pulse (HIPIMS) sources. The plasma pre-treatment processes were carried out in an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f28d4e0bc3896a4162517b26037b5f06
https://doi.org/10.1016/j.tsf.2011.09.011
https://doi.org/10.1016/j.tsf.2011.09.011
Autor:
V. Bellido-Gonzalez, M. Audronis
Publikováno v:
Surface and Coatings Technology. 205:S322-S325
This paper investigates the effect of sputter target oxidation level on reactive process behaviour during High Power Impulse Magnetron Sputtering of transition metal target (Ti) in Ar/O 2 atmosphere. It was found by this study that the sputter target
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36433555998a61d1df5d9fd6f9723dc2
https://doi.org/10.1016/j.surfcoat.2011.02.056
https://doi.org/10.1016/j.surfcoat.2011.02.056
Autor:
M. Audronis, V. Bellido-Gonzalez
Publikováno v:
Surface and Coatings Technology. 205:3613-3620
The two most important issues limiting reactive high power impulse magnetron sputtering (HIPIMS) process applicability until recently were the absence of suitable reactive HIPIMS control means and the limited capability of HIPIMS power supplies in te
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e41a5be906c99bb14dbea667a0e31f7
https://doi.org/10.1016/j.surfcoat.2010.12.038
https://doi.org/10.1016/j.surfcoat.2010.12.038
Publikováno v:
Surface and Coatings Technology. 204:2159-2164
High power impulse magnetron sputtering (HIPIMS) is a technologically important physical vapour deposition (PVD) process that is able to provide a highly ionised flux of sputtered species. It is thought to be particularly important for applications w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4de24f5f37b17e8b5c857552e13844d2
https://doi.org/10.1016/j.surfcoat.2009.11.040
https://doi.org/10.1016/j.surfcoat.2009.11.040
Autor:
M. Audronis, V. Bellido-Gonzalez
Publikováno v:
Thin Solid Films. 518:1962-1965
Hysteresis behaviour during reactive High Power Impulse Magnetron Sputtering (HIPIMS) has been investigated in detail. Such analysis has been made possible by the recently developed plasma emission monitoring based reactive HIPIMS monitoring and cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9416a947af414ed8108a4d321e9abdbc
https://doi.org/10.1016/j.tsf.2009.12.011
https://doi.org/10.1016/j.tsf.2009.12.011
Publikováno v:
Acta Materialia. 56:4172-4182
The composition, structure and mechanical properties of pulsed-DC unbalanced magnetron sputtered Ti–Si–B thin films—hard coatings with the potential for excellent thermal stability and oxidation resistance—are investigated and reported in thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b06a91c7378c0152b77c4afecdee93b
https://doi.org/10.1016/j.actamat.2008.04.047
https://doi.org/10.1016/j.actamat.2008.04.047