Zobrazeno 1 - 10
of 53
pro vyhledávání: '"M. Antcliffe"'
Autor:
Patrick Fay, Bob Grabar, James M. Chappell, Peter Chen, Isaac Khalaf, Erdem Arkun, Jeong-Sun Moon, M. Antcliffe, Nivedhita Venkatesan, Joel Wong, Andrea Corrion
Publikováno v:
IEEE Electron Device Letters. 41:1173-1176
We report scaled, graded-channel AlGaN/GaN HEMTs with an extrinsic fT and fMAX of 170 GHz and 363 GHz, which is the highest in emerging graded-channel GaN HEMTs. At 50-nm gate length, the fT*Lg of 8.5 GHz $\ast \mu \text{m}$ is comparable to that of
Autor:
Patrick Fay, Isaac Khalaf, R. Grabar, Erdem Arkun, Andrea Corrion, J. Wong, P. Chen, James M. Chappell, M. Antcliffe, Nivedhita Venkatesan, Jeong-Sun Moon
Publikováno v:
Electronics Letters. 56:678-680
The authors report on highly scaled 60 nm gate length graded-channel AlGaN/GaN high electron mobility transistors (HEMTs) with a record power added efficiency (PAE) of 75% at 2.1 W/mm power density at Vdd = 10 V and the PAE of 65% at 3.0 W/mm power d
Autor:
Erdem Arkun, Andrea Corrion, Joel Wong, James M. Chappell, Nivedhita Venkatesan, Peter Chen, Isaac Khalaf, M. Antcliffe, Chuong Dao, Patrick Fay, Bob Grabar, Jeong-Sun Moon
Publikováno v:
2020 IEEE/MTT-S International Microwave Symposium (IMS).
We report high-speed graded-channel GaN HEMTs with 10 dB OIP3 improvement over current conventional AlGaN/GaN HEMTs at the same DC power. Thus, the graded-channel GaN HEMTs demonstrated a record OIP3/Pdc of 17 - 20 dB at 30 GHz. Also, these graded-ch
Publikováno v:
Electronics Letters. 54:657-659
Highly scaled 90 nm gate-length field-plated (FP) aluminium gallium nitride (GaN)/GaN high electron mobility transistors (HEMTs) with a record current gain cut-off frequency (f T) of 95 GHz and maximum oscillation frequency (f MAX) of 200 GHz is repo
Autor:
Issac Khalaf, M. Antcliffe, Erdem Arkun, Peter Chen, Jeong-Sun Moon, Andrea Corrion, Bob Grabar, Joel Wong
Publikováno v:
2019 14th European Microwave Integrated Circuits Conference (EuMIC).
We report the first demonstration of graded-channel GaN HEMTs operating in the millimeter-wave frequency range. At 30 GHz, these graded-channel GaN HEMTs demonstrated excellent PAE of 72% at associated power density of 2 W/mm. The measured PAE and ou
Autor:
Peter Chen, Jeong-Sun Moon, Isaac Khalaf, Joel Wong, Taylor Post, Bob Grabar, Andrea Corrion, Erdem Arkun, M. Antcliffe
Publikováno v:
2019 IEEE MTT-S International Microwave Symposium (IMS).
We report the first demonstration of graded-channel GaN HEMTs operating in the millimeter-wave frequency range. At 30 GHz, these graded-channel GaN HEMTs demonstrated excellent PAE of 65% at an associated power density of 3 W/mm. The measured PAE and
Autor:
Baohua Yang, Kyung-Ah Son, D. Wong, Song Hyok Jae, Dustin Le, M. Antcliffe, Helen Fung, Hwa-Chang Seo, Jeong-Sun Moon, C. McGuire, Adele E. Schmitz, Jongchan Kang
Publikováno v:
IEEE Transactions on Terahertz Science and Technology. 5:344-350
We report millimeter-wave and sub-terahertz detection using graphene FETs up to 220 GHz at zero-bias to reduce $1/f $ noise. Detection leveraged the nonlinearity of the channel resistance through resistive field-effect transistor mixing for high-dyna
Autor:
Peter W. Pairaudeau, Aderonke A. Adeniji, Jan M. Antcliffe, Alison Purcell, C. Sinha, Lorraine Pearson, Susan Tutty, Stephen W. Lindow
Publikováno v:
Drug and Alcohol Review. 29:189-192
Introduction and Aims. The fact that particular parents suffer afflictions limiting their ability to care does not mean that they should automatically be deemed unsuitable parents. Prompted by neonatal team concerns about child-care issues, a local m
Autor:
Jeong-Sun Moon, Miroslav Micovic, P. Willadson, Paul Hashimoto, M. Antcliffe, C. McGuire, D. Wong, M. Hu
Publikováno v:
IEEE Electron Device Letters. 29:834-837
We report small- and large-signal performances of 140-nm gatelength field-plated GaN HEMTs at Ka-band frequencies, in which the GaN HEMTs were fabricated with n+ source contact ledge. The parasitic channel resistance is reduced by ~ 50%, whereas the
Autor:
Peter M. Asbeck, Virginia D. Wheeler, Kangmu Lee, Richard S. Ross, Jeong S. Moon, Fred Stratan, Adele E. Schmitz, Hwa-Chang Seo, D. Kurt Gaskill, M. Antcliffe, Andrey A. Kiselev, Luke O. Nyakiti
Publikováno v:
IEEE Electron Device Letters. 34:1190-1192
We report the first experimental demonstration of a lateral graphene heterostructure field-effect transistor (HFET) at wafer scale, where the graphene heterostructure channel consists of epitaxial graphene (Gr)/fluorographene (GrF)/graphene (Gr). GrF