Zobrazeno 1 - 10
of 61
pro vyhledávání: '"M. Al Khalfioui"'
Autor:
J. D. Miller, J. F. McNulty, B. J. Ruck, M. Al Khalfioui, S. Vézian, M. Suzuki, H. Osawa, N. Kawamura, H. J. Trodahl
Publikováno v:
Physical Review B. 106
Publikováno v:
Applied Physics Letters. 122:092402
A unique bulk-origin perpendicular magnetic anisotropy (PMA) is reported in thin films of the cubic ferromagnetic semiconductor Gd xSm1− xN. PMA behavior is clearly signaled by in-vs-out-of-plane magnetic hysteresis showing out-of-plane remanence o
Autor:
Jesús Zúñiga-Pérez, Marius Grundmann, M. Al Khalfioui, Guillaume Saint-Girons, Romain Bachelet, Céline Lichtensteiger, A. Welk, Christiane Deparis, P. John, H. Rotella, Maxime Hugues
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2021, 130 (6), pp.065104. ⟨10.1063/5.0057307⟩
Journal of Applied Physics, American Institute of Physics, 2021, 130 (6), pp.065104. ⟨10.1063/5.0057307⟩
International audience; Single-crystalline Zn3N2 thin films have been grown on MgO (100) and YSZ (100) substrates by plasma-assisted molecular beam epitaxy. Depending on growth conditions, the film orientation can be tuned from (100) to (111). For ea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::37cc50955828f90e1cf2a508e47c5dda
https://hal.archives-ouvertes.fr/hal-03319215
https://hal.archives-ouvertes.fr/hal-03319215
Akademický článek
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Akademický článek
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Autor:
Khalid Hossain, N. J. Estes, Bin Wang, M. Al Khalfioui, Mathieu Leroux, Evan R. Glaser, C. R. Brown, Joseph G. Tischler, Terry Golding, Ian R. Sellers, Chase T. Ellis, V. R. Whiteside
Publikováno v:
RSC Advances. 7:25353-25361
Due to its 1 eV band gap and GaAs-matched lattice constant, GaInNAs has long been considered for use in four-junction multi-junction solar cells; but, material quality issues have impeded its use in highly efficient devices. Here, we present an analy
Autor:
M. Al Khalfioui, M. Korytov, Benjamin Damilano, Jean Massies, Julien Brault, Virginie Brandli, Thi Huong Ngo, Samuel Matta, Pierre Valvin, Philippe Vennéguès, Bernard Gil, Mathieu Leroux
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2019, 126 (20), pp.205701. ⟨10.1063/1.5115593⟩
Journal of Applied Physics, American Institute of Physics, 2019, 126 (20), pp.205701. ⟨10.1063/1.5115593⟩
AlyGa1−yN quantum dots (QDs) have been grown by molecular beam epitaxy on AlxGa1−xN (0001) using a 2-dimensional–3-dimensional growth mode transition that leads to the formation of QDs. QDs have been grown for Al compositions y varying between
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eada980723e1a772f08ec75b79becc31
https://hal.archives-ouvertes.fr/hal-02380035
https://hal.archives-ouvertes.fr/hal-02380035
Autor:
Benjamin Damilano, Samuel Matta, Ryszard Piotrzkowski, Elzbieta Litwin-Staszewska, Mathieu Leroux, Leszek Konczewicz, Sylvie Contreras, Sandrine Juillaguet, Julien Brault, Hervé Peyre, M. Al Khalfioui
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2020, 128 (8), pp.085703. ⟨10.1063/1.5140561⟩
Journal of Applied Physics, American Institute of Physics, 2020, 128 (8), pp.085703. ⟨10.1063/1.5140561⟩
International audience; This paper discusses the results of high temperature resistivity and Hall effect studies of Mg-doped GaN and AlxGa1−xN epilayers (0.05
Akademický článek
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Autor:
Benjamin Damilano, Samuel Matta, Mathieu Leroux, M. Al Khalfioui, Sylvie Contreras, Hervé Peyre, Sandrine Juillaguet, Leszek Konczewicz, Julien Brault
Publikováno v:
Journal of Physics Conference Series
33RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS
33RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, 2017, Peking, China. pp.UNSP 012018, ⟨10.1088/1742-6596/864/1/012018⟩
33RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS
33RD INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, 2017, Peking, China. pp.UNSP 012018, ⟨10.1088/1742-6596/864/1/012018⟩
In this report, are shown the results of high temperature resistivity and Hall Effect studies of Mg-doped GaN epilayers. The samples studied were grown on (0001) (c-plane) sapphire by molecular beam epitaxy and 0.5 μm GaN:Mg layers have been achieve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ba96f28038ff416db0a88288eec7ae07
https://hal.archives-ouvertes.fr/hal-01935176
https://hal.archives-ouvertes.fr/hal-01935176