Zobrazeno 1 - 10
of 25
pro vyhledávání: '"M. A. Blount"'
Autor:
D. Towner, C. Ryder, M. A. Blount, C. Auth, K. Sethi, J. R. Weber, Che-Yun Lin, U. E. Avci, A. J. Welsh, C. M. Pelto, A. Kundu, R. Grover, Rahim Kasim, D. Seghete, A. Schmitz, J. Hicks
Publikováno v:
IRPS
We present a high density MIM decoupling capacitor that enables improved microprocessor performance by providing robust on-chip power supply droop reduction. The MIM dielectric is fabricated using ALD-deposited HfO 2 -Al 2 O 3 and HfO 2 -ZrO 2 high-k
Publikováno v:
Superlattices and Microstructures. 27:463-468
We study the low-temperature in-plane magnetoconductance of vertically coupled double quantum wires. Using a novel flip-chip technique, the wires are defined by two pairs of mutually aligned split gates on opposite sides of a ≤ 1 micron thick AlGaA
Publikováno v:
Physica E: Low-dimensional Systems and Nanostructures. 6:689-693
The authors report on their recent experimental studies of vertically-coupled quantum point contacts subject to in-plane magnetic fields. Using a novel flip-chip technique, mutually aligned split gates on both sides of a sub micron thick double quant
Autor:
M.J. Hafich, M. A. Blount, Sungkwun Kenneth Lyo, W. E. Baca, J. S. Moon, J. A. Simmons, John L. Reno, Joel R. Wendt
Publikováno v:
Journal of Applied Physics. 84:5626-5634
We report on our work on the double electron layer tunneling transistor (DELTT), based on the gate-control of two-dimensional -- two-dimensional (2D-2D) tunneling in a double quantum well heterostructure. While previous quantum transistors have typic
Publikováno v:
Semiconductor Science and Technology. 13:A180-A183
We demonstrate the double electron layer tunnelling transistor (DELTT), based on the gate control of two-dimensional-two-dimensional tunnelling in a double quantum well. Unlike previously proposed resonant tunnelling transistors, the DELTT is entirel
Publikováno v:
Semiconductor Science and Technology. 13:A86-A89
We describe the first demonstration of dual-side electron beam lithography in achieving independent submicron gating in double quantum well devices. The technique utilizes the epoxy-bond and stop-etch process to remove the substrate material which al
Publikováno v:
Physical Review B. 57:14882-14885
We investigate the transport properties of an extremely-coupled Al{sub x}Ga{sub 1{minus}x}As/GaAs double quantum well subject to in-plane magnetic fields B{sub {parallel}}. The coupling is sufficiently strong that the symmetric-antisymmetric gap ener
Epoxy bond and stop-etch (EBASE) technique enabling backside processing of (Al)GaAs heterostructures
Autor:
N. E. Harff, W. E. Baca, H. C. Chui, Jerry A. Simmons, Marc E. Sherwin, M. A. Blount, Mark V. Weckwerth
Publikováno v:
Superlattices and Microstructures. 20:561-567
The epoxy bond and stop-etch (EBASE) technique enables both the frontside and the backside processing of very thin (∼3000A) GaAs/AlGaAs epitaxial layer structures. Using this technique, a conventionally processed epitaxial layer structure is invert
Publikováno v:
Applied Physics Letters. 74:314-316
We demonstrate unipolar complementary circuits consisting of a pair of resonant tunneling transistors based on the gate control of 2D-2D interlayer tunneling, where a single transistor - in addition to exhibiting a welldefined negative-differential-r