Zobrazeno 1 - 10
of 195
pro vyhledávání: '"M Vellvehi"'
Autor:
M. Vellvehi, G. Giorgio, F. Bonet, E. Bochaca, O. Avino, Xavier Perpiñà, Phillippe Godignon, Xavier Jordà
Publikováno v:
2020 32nd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
For the first time, die-level current crowding phenomena are analyzed at the microsecond timescale with an internal IR-Laser Deflection (IIR-LD) set-up. As a test vehicle, a 1.2 kVSiC Schottky diode ($1.6\times 1.6\mathrm{m}\mathrm{m}^{2}$ active are
Autor:
O. Avino, Phillippe Godignon, M. Vellvehi, Naum Fuste, David Sánchez, S. Massetti, Xavier Perpiñà, Xavier Jordà, Carles Ferrer
Publikováno v:
2020 21st International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).
In this work, SiC Schottky diodes specifically developed for the BepiColombo space mission are studied by Lock-in Infrared Thermography (LIT) to analyse local defects observed in their top metallization and passivation layers appeared after thermal v
Autor:
Naum Fuste, Xavier Perpiñà, M. Vellvehi, O. Avino, I. Obieta, Xavier Jordà, R. Seddon, Phillippe Godignon, J. Maudes
Publikováno v:
2020 21st International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).
Diamond is one of the best wide band-gap semiconductor materials available for high power devices development in terms of high current capability, high temperature operability, breakdown voltage and switching speed. Unfortunately, fabrication technol
Autor:
Xavier Jordà, Matthieu Florentin, M. Vellvehi, Dominique Tournier, Mihaela Alexandru, Viorel Banu
Publikováno v:
Materials Science Forum. :1130-1134
Due to our demonstrated stable Tungsten-Schottky barrier at elevated temperatures, and also thanks to our technological process maturity regarding SiC-Schottky contact fabrication, we have implemented the digital logic gates library adopting a normal
Publikováno v:
Materials Science Forum. :1048-1051
The design and development of SiC integrated circuits (ICs) nowadays is a necessity due to the increasing demand for high temperature intelligent power applications and intelligent sensors. Due to the superior electrical, mechanical and chemical prop
Publikováno v:
Materials Science Forum. 711:104-108
– 4H-SiC MESFET transistors are very attractive devices for high temperature application and communications. The JFET and MESFET transistors have a promising potential for integrated circuits able to operate at high temperature and harsh radiation
Akademický článek
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Akademický článek
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Publikováno v:
Proceedings of the 19th IEEE International Symposium on Power Semiconductor Devices and IC's
ISPSD '07
ISPSD '07, May 2007, Jeju Island, South Korea. pp.285-288, ⟨10.1109/ISPSD.2007.4294988⟩
ISPSD '07
ISPSD '07, May 2007, Jeju Island, South Korea. pp.285-288, ⟨10.1109/ISPSD.2007.4294988⟩
International audience; 4H-SiC JBS diodes have been manufactured on a Norstel epitaxied N/N+ substrate using a JTE as edge termination. A breakdown voltage higher than 3.5 kV has been measured on 0.16 and 2.56 mm2 diodes. The leakage current in the 2
Autor:
David Flores, Phillippe Godignon, L. Moreno Hagelsieb, José Millan, Denis Flandre, M. Vellvehi
Publikováno v:
Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment ISBN: 1402030118
The goal of this work is to explore different ways for co-integrating a power DMOS device in the bulk Si-substrate which underlies the SOI buried oxide and thin Si overlayer, providing optimal performance and isolation of both kinds of devices. A fir
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8d513950b79c335a6cbd35558dbbfd8
https://doi.org/10.1007/1-4020-3013-4_31
https://doi.org/10.1007/1-4020-3013-4_31