Zobrazeno 1 - 10
of 15
pro vyhledávání: '"M Schauler"'
Publikováno v:
Microelectronic Engineering. 46:323-326
The characteristics of Cl"2?Ar chemically-assisted ion-beam etching processes for GaN and GaAs are reported. The etch rate and anisotropy have been investigated varying ion energy, tilt angle, substrate temperature, and Cl"2 flow. Vertical and smooth
Autor:
C. Kirchner, M. Boćkowski, Pawel Prystawko, Tadeusz Suski, Markus Kamp, Henryk Teisseyre, A. Śliwinski, M Schauler, J. Z. Domagala, S. Porowski, Michał Leszczyński, A Pelzmann
Publikováno v:
Journal of Crystal Growth. :1061-1065
InxGa1−xN and AlxGa1−xN layers were grown by metalorganic chemical vapour deposition (MOCVD) on highly conductive single crystals of GaN. The samples were then examined using X-ray diffraction and photoluminescence. It was found that there is a s
Autor:
T. Rotter, D. Mistele, J. Aderhold, O. Semchinova, M Schauler, M Mayer, C Ahrens, Franz Eberhard, Dirk Uffmann, H. Klausing, J. Graul, Markus Kamp, J. Stemmer
Publikováno v:
Semiconductor Science and Technology. 14:637-641
We report on the influence of different pre-etch methods on specific contact parameters of GaN contacts. For these investigations we used ex situ chemically assisted ion beam etching and in situ sputter etching before metal deposition. The electrical
Autor:
Christoph Kirchner, M Schauler, Karl Joachim Ebeling, M Mayer, P. Unger, Markus Kamp, A Pelzmann, Franz Eberhard
Publikováno v:
Journal of Crystal Growth. :782-785
Ultra-violet emitting diodes with electroluminescence linewidths as narrow as 8 nm have been grown by molecular beam epitaxy. Double-heterostructure pn- and homotype pin-diodes reveal single-peak emission at wavelengths around 371 nm. The dependence
Autor:
Jürgen Christen, Karl Joachim Ebeling, V. Schwegler, Izabella Grzegory, Markus Kamp, Michał Leszczyński, Pawel Prystawko, T. Riemann, S. Porowski, C. Kirchner, Franz Eberhard, A Pelzmann, Frank Bertram, M Schauler
Publikováno v:
Applied Physics Letters. 74:1123-1125
Chemically assisted ion-beam etching (CAIBE) was used to remove subsurface damage from polished GaN bulk substrates prior to growth. Subsequently, GaN layers were deposited by metalorganic vapor phase epitaxy. Only the CAIBE-treated areas reveal a mi
Autor:
G. Stareev, Eckard Deichsel, Karl Joachim Ebeling, Wolfgang Schmid, Franz Eberhard, J. Joos, Martin Grabherr, U. Martin, Rainer Michalzik, M Schauler, Roland Jaeger, Roger King, Michael W. Miller
Publikováno v:
SPIE Proceedings.
We present a non-resonant light emitting diode with a novel concept of light outcoupling. Light is generated in the center of a radially symmetric structure and propagates between two mirrors of a tapered region where outcoupling occurs. Principles o
Autor:
M Schauler, P. Unger, M Mayer, Karl Joachim Ebeling, C. Kirchner, A Pelzmann, Franz Eberhard, Markus Kamp
Publikováno v:
MRS Internet Journal of Nitride Semiconductor Research. 2
GaN based homo- and heterotype LED's have been fabricated and characterized which emit in the blue and ultra-violet part of the spectral range. Complete epitaxial LED layer sequences with different recombination zones have been grown using MOVPE as w
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