Zobrazeno 1 - 10
of 14
pro vyhledávání: '"M S M, Saifullah"'
Publikováno v:
Electron Microscopy and Analysis 1997 ISBN: 9781003063056
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a516bad8d00569ac78e31924121c8969
https://doi.org/10.1201/9781003063056-43
https://doi.org/10.1201/9781003063056-43
Publikováno v:
Soft matter. 3(5)
An increasing number of technologies require the fabrication of micro- and nanostructures over large areas. Soft lithographic methods are gaining in popularity for the manufacture of low-cost micrometre and sub-micrometre structures. Increasingly, th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::56c9b1fc4dfa15ac1c9367e00a8d582c
https://pubmed.ncbi.nlm.nih.gov/32900018
https://pubmed.ncbi.nlm.nih.gov/32900018
Publikováno v:
Biomaterials science. 2(12)
Previous studies have shown that fundamental cell functions such as adhesion, proliferation, and morphology are regulated by the interaction of cells with basement membrane nano- and micron- scale surface topography. By taking the basement membrane a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::3c6d40d8c64eb4d35eeb03ce075a5b16
https://pubmed.ncbi.nlm.nih.gov/32481952
https://pubmed.ncbi.nlm.nih.gov/32481952
Publikováno v:
Journal of Applied Physics. 86:2499-2504
Electron beam-induced crystallization studies in amorphous FeF3 films using electron energy loss spectroscopy (EELS) are discussed in this letter. Time-resolved EELS studies show that the coordination polyhedra in amorphous FeF3 (a-FeF3) are randomly
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b121fcbada6bb41e909394106f60e34b
https://doi.org/10.1063/1.371083
https://doi.org/10.1063/1.371083
Publikováno v:
MRS Proceedings. 398
Metal fluorides are excellent candidates as high resolution inorganic resists in electron beam nanolithography. Hence it is important to study their damage characteristics under the electron beam to understand their behaviour as inorganic resists. In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74064b1e105d7c978ea9b37a59e9262a
https://doi.org/10.1557/proc-398-195
https://doi.org/10.1557/proc-398-195
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:2737
The electron beam exposure characteristics of sputtered AlOx and spin-coatable Al2O3 resists are compared and contrasted. When exposed to an electron beam, sputtered AlOx resists on a silicon substrate undergo an intense mass loss. However, electron
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5f3a01413608904bca49829bc6d8c76
https://doi.org/10.1116/1.1323970
https://doi.org/10.1116/1.1323970
Autor:
Ramakrishnan Ganesan, Su Hui Lim, M. S. M. Saifullah, Hazrat Hussain, John X. Q. Kwok, Ryan L. X. Tse, Htoo A. P. Bo, Hong Yee Low
Publikováno v:
Journal of Materials Chemistry; Mar2011, Vol. 21 Issue 12, p4484-4492, 9p
Autor:
M. S. M. Saifullah, K. R. V. Subramanian, D.-J. Kang, D. Anderson, W. T. S. Huck, G. A. C. Jones, M. E. Welland
Publikováno v:
Advanced Materials; Jul2005, Vol. 17 Issue 14, p1757-1761, 5p
Autor:
Rajagopalan Ramaswamy, Tanmay Dutta, Shiheng Liang, Guang Yang, M S M Saifullah, Hyunsoo Yang
Publikováno v:
Journal of Physics D: Applied Physics; 5/29/2019, Vol. 52 Issue 22, p1-1, 1p
Publikováno v:
Journal of Physics D: Applied Physics; 11/11/2015, Vol. 48 Issue 44, p1-1, 1p