Zobrazeno 1 - 2
of 2
pro vyhledávání: '"M Marc Schaepkens"'
Autor:
M Marc Schaepkens, RJ René Severens, van de Mcm Richard Sanden, Hjm Eric Verhoeven, DC Daan Schram
Publikováno v:
Review of Scientific Instruments, 67(10), 3624-3626. American Institute of Physics
A method to determine the electrical conductance of thin films such as a‐Si:H that does not require contacting electrodes is presented. This method, introduced by Sommer and Tanner, is based on measuring the phase shift of a capacitive transmission
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::af3fef7df366d6c15a15311b339494b5
https://doi.org/10.1063/1.1147125
https://doi.org/10.1063/1.1147125
Autor:
DC Daan Schram, M Marc Schaepkens, van de Mcm Richard Sanden, Gjh Seth Brussaard, Kgy Karine Letourneur
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21:61
Photoresist is etched using a remote thermal (cascaded arc) plasma in Ar/O2 and Ar/O2N2 mixtures. Very high etch rates, up to 200 nm/s, are achieved at low substrate temperatures (350 K) and low electron and ion temperatures (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3367e3fa2e2638f228480cfe12ba07b
https://doi.org/10.1116/1.1532021
https://doi.org/10.1116/1.1532021